全部 98.00% 97.00% 95.00% ≥95% ≥98% ≥97% 99.00% 96.00% ar ≥98%(gc) 90.0% ≥99% ≥96% >98.0%(gc) ≥98%,99%e.e. br 99.9% metals basis 99.99% metals basis 97%(hplc) ≥97%(gc) ≥98 atom % d ≥98%(hplc) ≥98%(t) >99% ≥95%(gc) 99.500% ≥98.0% ≥98% (hplc) ≥98%(gc)(t) ≥98%,≥99% e.e. ar,99% 分析对照品,>98% ≥90% 99.900% ar,99.0% >97% 85.00% >95% 99.999% metals basis 94.00% ar,98% 98%,ee99% cp ≥98%(hplc)(t) >97.0%(gc) 93.00% ≥99%(gc) 80.0% 99.9900% ar,99.5% ≥96%(gc) >98.0%(t) >95.0%(gc) >98% ≥95%,99%e.e. 100 μg/ml 异辛烷溶液 ≥90%(gc) 0.5m in thf gr ≥98.0%(gc) ≥97.0% >99.0%(gc) ≥93% >98.0%(hplc) 92.00% 98 atom % d ≥98 % 99.95% metals basis 0.5 m solution in thf, mkseal ≥95%(t) 分析对照品 1.0 m solution in thf, mkseal ≥98.0%(hplc) cp,98% ≥97%(t) ≥97%(gc)(t) ≥98%(n) >98.0% >98%(gc) 99%,water≤50 ppm (by k.f.), mkseal 99.9% trace metals basis ≥95%(hplc) ≥98%(hplc)(n) ≥98%(lc) >96.0%(gc) 98.500% 99.9% (reo) ar,98.0% ≥94% ≧95% ≥95% (hplc) ≥97 % >98%(hplc) >98.0%(gc)(t) gr,99% sp ≥85% ≥95%,≥99%e.e. ≥99%(t) 固体 >98%(lc) >98.0%(hplc)(t) 75.00% 98% (hplc) 99.5% metals basis 99.99% trace metals basis analytical standard 99.99% (reo) >95% >98% ar,98.5% ≥80% ≥97%(hplc) ≥99.0% ≥99.99% metals basis >99.5% 98%,gc 99 atom % d 99.999% trace metals basis ≥98% (tlc) ≥98%(lc&n) ≥99.5% >97.0%(t) >99% (tlc) 70.0% cp,98.0% ≥95.0% >90.0%(gc) 98%,t 99% metals basis 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.8% metals basis 99.995% metals basis 99.99900% acs ≥92% ≥97% (hplc) gr,99.5% ≥95 % ≥95.0%(gc) ≥97%(hplc)(t) ≥98%,99%d.e. ≥98%,顺反混合物 ≥98.0% (hplc) ≥99.5%(gc) 分析对照品,98% 分析标准品 >95.0%(hplc) 50.0% 91.00% 98%(gc) 98%,lc&t 98%,顺反混合物 cp,97% ≥70% ≥98%(lc&t) ≥98%(t)(hplc) ≥99 % >98.0%(n) 0.5 m in thf 98%,99%ee 99 atom %13c 99.5%,with molecular sieves, water≤50 ppm (by k.f.), mkseal ≥93%(gc) ≥95.0% (hplc) ≥99%(hplc) 丰度:10atom%;化学纯度:≥98.5% 丰度:99atom%;化学纯度:≥98.5% >96% >99% (hplc) 99% trace metals basis 99.800% d,99% ≥95%(gc)(t) ≥97.0%(gc) ≥98%(gc&t) 无水, 粉末, 99.99% metals basis >95.0%(t) >97%(hplc) 0.25 m solution in thf, mkseal 1.0 m solution in thf,mkseal 95%,gc 97%(gc) 98%,99% e.e. >97% tech. 90% ≥85%(gc) ≥90%(t) ≥94%(gc) ≥95%(lc) ≥97.0% (hplc) ≥99.9% trace metals basis 无色液体 >97.0%(hplc) >99%(gc) 40.0% 88.00% 95%(gc) 95%(hplc) 95+% 98%,gc&t 99.5%,water≤50 ppm (by k.f.), mkseal 99.9% (metals basis) ar,97% ar,97.0% ≥80%(gc) ≥97%(lc) ≥98%,gc ≥98.0% (gc) ≥98.5% ≥99.9% 分析对照品,≥98% 无水, 粉末, 99.9% metals basis >90% >94.0%(gc) >99.0%(t) 1.0 m solution in hexanes, mkseal 2.0 m solution in thf, mkseal 65.00% 95% (hplc) 95% mix tbc as stabilizer 97%,99%ee 97+% 98%,mixture of isomers 98%,含稳定剂铜屑 98.0%(gc) 99%,water≤50 ppm (by k.f.),mkseal 99.99% metals basis,200目 ar,≥99% ar,≥99.5% d,99.5% ≥90%(hplc) ≥90.0% ≥96%(gc)(t) ≥98%,异构体混合物 ≥99.0%(gc) >95%(lc) >98%(gc&t) >99.0% (gc) >99.5%(gc) >= 95 % >= 97 % 0.5 m solution in thf ,mkseal 0.5m solution in thf 2.0 m solution in thf,mkseal 50% in h2o 50%水溶液 60%水溶液 95%,顺反混合物 97% (hplc) 97%,gc 97%,含有数量不等的酸酐 98%(hplc) 98%purity,99%e.e. 99 atom % 13c 99%,gc 99.5% trace metals basis 99.700% 99.9500% 99.98% metals basis acs,≥99.5% reagent grade, 98% spectrophotometric grade, ≥99% ≥60% ≥90% (hplc) ≥95%(lc&t) ≥95%,99%d.e. ≥98% (hplc), powder ≥98%(n)(t) ≥98%(t&lc) ≥98%,顺反异构体混合物 ≥98.0%(t) ≥99% trace metals basis ≥99%(gc)(t) 无水,99.9% metals basis 液体 环保级 >95%(gc) >96%(gc) >97%(gc) >97.0%(gc)(t) >98%(lc&n) >98%(t) >98.0%(hplc)(n) >98.0%(lc&n) >99% (gc) >= 98 % 1.0 m solution in thf ,mkseal 20 wt. % in h2o 200目 25%水溶液 300-400目 400目 82.00% 95%,含有数量不等的酸酐 95%混合(tbc作为稳定剂) 97% mix tbc as stabilizer 97%,>99% ee 97%,含不同量的酸酐 97%,异构体混合物 98 atom % 15n 98 atom % d, 98% (cp) 98% 99%ee 98%(mixture of isomers) 98%,lc&n 98%,lc 98%,water≤50 ppm (by k.f.), mkseal 98%,含不同量的酸酐 98%,异构体混合物 99 atom % 13c, 98% (cp) 99% (cp) 99%(gc) 99%,with molecular sieves, water≤50 ppm (by k.f.),mkseal 99%,含稳定剂mehq 99.9% metals basis,200目 99.9% metals basis,50nm 99.9% trace rare earth metals basis 99.997% metals basis 99.998% metals basis 99.999% (metals basis) 99.9999% metals basis acs, ≥99.0% ar 99% ar,99.8% gr,99.8% natural technical grade, 90 % ≥95%(hplc)(t) ≥95%(n) ≥96%(hplc) ≥96%(t) ≥96.0% ≥97%(lc&n) ≥97%(n)(t) ≥97%(n) ≥97.0%(t) ≥99% (gc) ≥99% (hplc) ≥99.0% (gc) ≥99.0%(hplc) ≥99.5% (gc) ≥99.99% trace metals basis 分析对照品,>95% 工业级 白色粉末 试剂级 > 98% >85.0%(gc) >90.0%(hplc) >93.0%(gc) >95%(lc&t) >95%(t) >95.0%(gc)(t) >95.0%(lc) >97.0%(hplc)(t) >97.0% >98%(lc&t) >99.0%(lc) >99.0% >99.5% (gc) 0.25m in tetrahydrofuran 0.5m in 2-methf 100-200目 1000μg/ml,溶于吹扫-捕集甲醇溶液中 30% in water 45%水溶液 5.0% pd basis 50 wt. % in h2o 60.0% 70% in water 70%水溶液 75-150目 89.00% 90%,t 95% (stabilized with tbc) 95%(t) 95%,stabilized with tbc 96%(hplc) 97% (stabilized with tbc) 97% 99%ee 97%+ 97.0% (gc) 98 atom %15n 98%+ 98%, stabilized with copper chip 98%,n 98%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%,含稳定剂hq 98%,顺反异构混合物 99% (metals basis) 99%,升华纯化 99.5%, water≤50 ppm (by k.f.), mkseal 99.5%,100目 99.8%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.9% metals basis,粉末 99.95% trace metals basis 99.99% (metals basis) acs,≥99.0% ar,>99.0%(gc) ar,90% ar,90.0% ar,95% ar,96% ar,≥98% cp,95% cp,98.5% cp,99.0% dye content 90% for spectrophotometric det. of cu, ≥99% gc gr,99.9% pestanal, analytical standard pt tech. 85% ≥70%(gc) ≥75%(gc) ≥75% ≥88%(gc) ≥92%(gc) ≥95% (gc) ≥95%,异构体混合物 ≥95%,顺反异构体混合物 ≥95.0% (gc) ≥96% (hplc) ≥96%(t&lc) ≥97 % sum of enantiomers ≥97.0% (gc) ≥97.0% (tlc) ≥98 atom % d, ≥98% (cp) ≥98%,含稳定剂铜屑 ≥98.0% (nt) ≥98.0% (t) ≥99% sum of enantiomers ≥99.0% (hplc) ≥99.0% (sum of enantiomers, gc) ≥99.9%(gc) ≥99.99% 丰度:98atom%;化学纯度:≥98.5% 丰度:99atom%;化学纯度:≥98% 分析对照品,99% 分析对照品,99.5% 分析对照品,≥99.5% 基质:sio2,表面基团:-cooh,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:4-5μm,单位:10mg/ml 无水,99.99% metals basis 离子对色谱级 粉末,99.9% metals basis >80.0%(gc) >90%(hplc) >90.0%(lc) >90.0%(t) >94% >95%(hplc) >95.0%(lc&t) >95.0%(n) >95.0% >96.0%(lc&t) >96.0%(t) >97%(gc&t) >97.0%(hplc)(n) >97.0%(lc) >98%(t&lc) >98.0%(lc) >98.0%(t)(hplc) >98.5%(gc) >99%(hplc) >99%, ee >98% >99.0%(gc)(t) >99.5%(lc) >= 99 % (d,99.5%) (d,99.9%) 0.1000mol/l(0.1m) 0.1mol/l 介质:h2o 0.5 m solution in thf,mkseal 0.50 m in 2-methf 0.5m solution in thf, mkseal 0.5mthf 1.0 m in h2o 1.0 m solution in heptane, mkseal 1.0 m solution in toluene, mkseal 1.0mg/ml in methanol 1.0mm 直径, 99.8% metals basis 10% in h2o 14% in h2o 2.0 m in thf, mkseal 2.0 m solution in hexanes, mkseal 200-300目 200mm 25% in water 25μg/ml in acetonitrile 30 wt. % in h2o 30nm 球形,99.5% 35.00% 40 wt. % in h2o 40% in water 40% 水溶液 40nm 球形,99.5% 40目 50 wt. % in water 50% in water 50% solution in h2o 50%甲苯溶液 50μg/ml in isooctane, analytical standard 50μm 65 wt. % in h2o 65% in h2o 70% hf 75% in h2o 80-85% 83.00% 9.5mm 直径,99.999% metals basis 90%,顺反混合物 92%,含有稳定剂mehq 95% (gc) 95% ,stabilized with mehq 95%(tbc作为稳定剂) 95%,40-60目 95%,98%ee 95%,ee99% 95%,gc&t 95%,mixture of isomers 95%,含稳定剂铜屑 95%,异构体混合物 95%,顺反异构体混和物 95%混合物(tbc作为稳定剂) 95.0%(gc) 96%+ 96%,gc 97%(cis- and trans- mixture) 97%,(hplc) 97%,mixture of isomers 97%,含铜稳定剂 97.0% (hplc) 97.0%(gc) 98 atom % d, 99% (cp) 98% metals basis 98% 异构体混合物 98%(cis- and trans- mixture) 98%(mehq作为稳定剂) 98%(stabilized with copper chip) 98%(stabilized with mehq) 98%, mixture of isomers 98%, water≤50 ppm (by k.f.), mkseal 98%, 异构体混合物 98%,100目 98%,含有数量不等的酸酐 98%,含稳定剂mehq 98%,含稳定剂tbc 98%,异构体的混合物 98+% 98.0% (hplc) 98atom% 99% (hplc) 99% (reo) 99%(lc-ms) 99%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99%, water≤50 ppm (by k.f.), mkseal 99%,2-4μm 99%,300目 99%,50nm 99%,hplc 99%,t 99%,单杂<0.1% 99%,含稳定剂铜屑 99%,含铜屑稳定剂 99.5 atom % d 99.8%,water≤50 ppm (by k.f.), mkseal 99.8%,water≤50 ppm (by k.f.),mkseal 99.9 % metals basis 99.9% metals basis,100nm 99.9% metals basis,10μm 99.9% metals basis,200nm 99.9% metals basis,20nm 99.9%(reo) 99.9%,2-5um 99.9%,200目 99.9%,50nm 99.9%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.9%,粉末 99.95 % metals basis 99.95% trace metal basis 99.9800% 99.99% metal basis 99.99% metals basis,10μm 99.99% metals basis,50nm 99.99% metals basis,粉末 99.99%(reo) 99.995% trace metals basis 99.9985% (metals basis) 99.999% metals basis,200目 99.999% metals basis,for perovskite precursor 99.9995% metals basis 99.9999% metals basis,块状 >97%(gc) >98%(gc) >99%metals basis,粒径:15nm,比表面积(bet):300±50m2/g >99% anhydrous,98% ar, 99% ar,50 wt. % in h2o ar,95.0% ar,96.0% ar,99.0 % ar,99.00% ar,99.5%(gc) ar,99.9% ar,≥99.0% average mw 250-500 bp reference standard br≈58% bs cp,96% cp,99% d,98% d,99.8% dye content 85 % ep reference standard fe2o3≤2ppm hplc≥98% lc-ms m.w. 2000 meets usp testing specifications mw 1000 pd 18.5% powder pt,99.8% reagent grade, 99% solid t-95% technical grade technical,≥90 % ulc-ms,0.1% in water usp级 ≥55% ≥60%(gc) ≥85%(hplc) ≥85%(t) ≥85.0% ≥89% ≥90% (gc) ≥90%(lc) ≥90.0%(gc) ≥90.0%(t) ≥91% ≥93%(t) ≥94% (hplc) ≥94%(t) ≥95% (tlc) ≥95% v basis ≥95%(hplc)(n) ≥95%(lc&n) ≥95%(t)(hplc) ≥95%,单酯和二酯的混合物 ≥95%,顺反混合物 ≥95.0% (tlc) ≥95.0%(t) ≥96%(lc) ≥96.0%(hplc) ≥97%(gc&t) ≥97%(lc&t) ≥97%,hplc ≥97%,含稳定剂铜屑 ≥97%,异构体混合物 ≥97%,顺反异构体混合物 ≥97.0% (nt) ≥97.0% (t) ≥98 atom % d, ≥99% (cp) ≥98% (hplc), solid ≥98%(gc&n) ≥98%(hplc),solid ≥98%(t)(gc) ≥98.0% (tlc) ≥98.5 % sum of enantiomers ≥98.5% (hplc) ≥98.5%(hplc) ≥99%,gc ≥99%,hplc ≥99.0% (t) ≥99.8%(gc) ≥99.8% ≥99.9% metals basis 丰度:98atom%;化学纯度:≥98% 丰度:99atom %;化学纯度:≥98.5% 分子量1000 分子量~4000 分析对照品, 99.5% 分析对照品, ≥98%(hplc) 分析对照品, ≥98% 分析对照品,>96% 分析对照品,≥99% 分析标准品,98% 分析标准品,≥98% 基质:sio2,表面基团:-cooh,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/ml 支链异构体混合物 无水、粉末、99.99% 生物技术级 用于gc衍生化,99% 用于酶联免疫,≥99.0% 超干, 99.9% (reo) 超干, 99.99% (reo) 超干, 99.99% metals basis 超干, 99.999% metals basis 超纯级,99.0% 重蒸馏,99.5% 重蒸馏,≥99.5% > 98 % hplc, powder > 98 % > 99 % hplc, solid >100 iu/mg >30 % absorption capacity (water)(at 80% rel. humidity, 25°c) >30u/mg,来源于兔肌 >40.0%(gc) >52%(gc) >60.0%(gc) >75%(gc) >80.0%(gc),含200-650ppm mehq稳定剂 >80.0%(lc) >80.0%(t) >80.0% >85%(gc) >85%, stabilized with hydroquinone >85.0%(hplc) >86.0%(lc) >90%(gc),单脂 >90%(gc),含100 ppm 对叔丁基邻苯二酚稳定剂 >90%(lc) >90%(t) >90.0%(gc),含稳定剂bht >90.0%(n) >92%(t) >92% >93%(gc) >93%(hplc) >93%(t) >93.0%(hplc)(t) >93.0%(hplc) >93.0%(lc),顺反混合物 >93.0% >95% (lc-ms) >95.0%(gc&t) >95.0%(gc) ,含0.2 % caco3/mgo (1:1)稳定剂 >95.0%(gc),异构体混合物 >95.0%(hplc)(n) >95.0%(t),硬型,混合物 >96%(gc&t) >96.0%(gc),stabilized with hq >96.0%(hplc) >96.0%(lc&n) >96.0% >96.5% >97% (hplc) >97% (sum of isomers, gc) >97%(lc&n) >97%(t&lc) >97%(t) >97.0%(gc&t) >97.0%(gc),含稳定剂铜 >97.0%(lc&t) >97.0%(n) >97.0%,total of isomer >97.5% >98% usp >98%(gc&n) >98%(gc) , 含铜作稳定剂 >98.0% (gc) >98.0%(gc&t) >98.0%(gc),含100ppm环氧丙烷稳定剂 >98.0%(hplc)(w) >98.0%(lc&t) >98.0%(lc),含≤5%己烷 >98.0%(lc),含≤5%的二氯甲烷 >98.0%(n)(t) >98.0%(t&lc) >98.0%(w) >99% (lpc; may contain up to 10% of the 2-lpc isomer, tlc) >99%(gc),包含180-200 ppm mehq 稳定剂 >99.0% (gc), 无色液体 >99.0% (hplc) >99.0%(gc),250ppm mehq做稳定剂 >99.0%(gc),含mehq稳定剂 >99.0%(gc),用于hplc荧光标记 >99.5%(hplc) >99.7%(gc) >99.8%(gc) >99.9% (gc) >99.998% >= 98 % hplc, solid >= 98 % tlc, powder >= 99 %, powder >= 99.5 % >=97 % <1% diethylene glycol monobutyl ether <100nm,99.9% metals basis <45μm (10-20%)[用于酯化] (1mg/ml的甲醇溶液)[用于水分析] (5-10%)[用于酯化] (99.99%-ce) (reo) (99.99%-pr)(reo) (d, 99%) dcl 20% in d2o (d, 99%) dcl 36.5% in d2o (d, 99%) (d, 99.5%) (<5% d2o) (d, 99.5%) 40% in d2o (d, 99.5%)+ 0.03% v/v tms (d, 99.5%) (d, 99.96%) (d,99.5%) +0.03% v/v tms (d,99.8%) +0.03% v/v tms (d,99.8%)(0.03% v/v tms) (d,99.8%)+0.03% v/v tms (d,99.8%) (d,99.9%) + 0.03 % (v/v) tms (d,99.96%)(+0.03% v/v tms) (d2, 98%) (d3, 98%) (d3, 99%) (d4, 98%) (d5, 99%) (d7, 98%) (dhqd)2phal:0.552% (e)+(z),98% (w/w=7/3) (顺式+ 反式), ≥92%(gc) -100 目, 99.9% (metals basis) -100 目, 99.999% (metals basis) -200+325目, 99.95% metals basis -200目,97% -22 目, 99.995% metals basis -22 目,99.998% metals basis -22 目,99.999% (metals basis) -325目, 99.5% metals basis -325目,99.99% (metals basis去除ta), ta <500ppm -40 目, 99.9% (reo) 0.01 g/ml的硫酸铜水溶液 0.015mm 直径, 99.95% metals basis 0.015mol/l 介质:h2o 0.01mol/l 介质:h2o 0.05 mol/l naoh(0.05摩尔/升 氢氧化钠) 0.05000mol/l(0.05m) 0.05mm 直径,99.995% metals basis 0.05mol/l 介质:h2o 0.05mol/l,介质:h2o 0.0979mol/l 介质:h2o 0.1 g/ml的氢氧化钠水溶液 0.1 m cf3so3h in acetic acid 0.1 m in methanol, mkseal 0.1 m solution in thf , mkseal 0.1001mol/l 介质:95%乙醇 0.104m in methylvinylcyclosiloxanes 0.1m in thf 0.1mm 厚, 99.9% (reo) 0.1mm 厚, 99.9% metals basis 0.1mm 厚, 99.99% metals basis 0.1mm 直径, 99.99% metals basis 0.1mm,99.9% metals basis 0.1mm,99.99% metals basis 0.1mol/l,介质:h2o 0.2 mm,99.9% metals basis 0.2 mm,99.99% metals basis 0.2%溶液 0.25 m solution in 2-methyltetrahydrofuran 0.25 m solution slurry in thf, mkseal 0.25m solution in thf, mkseal 0.25m solution in thf 0.25mm 直径, 99.99% (metals basis 去除 ta) 0.2mm直径,99.999% metals basis 0.2mol/l 介质:h2o 0.3 m solution in thf, mkseal 0.3mm 厚, 99.9% (reo) 0.4 m solution in 1,4-dioxane, mkseal 0.5 m in tetrahydrofuran 0.5 m slurry in thf ,mkseal 0.5 m solution in thf 0.5%溶液 0.50 m solution in 2-methyltetrahydrofuran, mkseal 0.50 m solution in 2-methyltetrahydrofuran 0.5m in thf,mkseal 0.5m,ph10 0.5m,溶于四氢呋喃 0.5mincyclohexane 0.5minthf 0.5mm 厚, 99.998% metals basis 0.5mm 厚,99.9975% metals basis 0.5mm 直径, 99.998% metals basis 0.5mol/l in thf 0.5mol/l 介质:h2o 0.5msolutioninthf,mkseal 0.62mm 厚, 99.9% (reo) 0.6minthf 0.7 m solution in thf,water≤1000ppm, mkseal 0.7m solution in hexanes, mkseal 0.8-12mm (0.03-0.47in), 99.98% (metals basis) 0.8m solution in thf, mkseal 0.9 m in heptane , mkseal 0.9m solution in thf, mkseal 1 m in thf, mkseal 1 mol/l 1 μm,98.5% 1% in h2o 1%溶液 1,000 mesh 1-10 μm,98% 1-3mm (0.04-0.1in),99.9997% (metals basis) 1-3mm,99.999% metals basis 1-3μm, ≥99% metals basis 1.0 m in heptane, mkseal 1.0 m in heptane 1.0 m in hexane, mkseal 1.0 m in thf,mkseal 1.0 m in thf/hexanes, mkseal 1.0 m in thf 1.0 m in toluene 1.0 m solution in 2-methyl-thf, mkseal 1.0 m solution in 2-methyltetrahydrofuran, mkseal 1.0 m solution in ethanol, mkseal 1.0 m solution in h2o 1.0 m solution in hexanes ,mkseal 1.0 m solution in tert-butyl methyl ether, mkseal 1.0 m solution in thf , mkseal 1.0 m 二氯甲烷溶液 1.0 mol/l in h2o 1.0%hcl in 70%乙醇 1.0%hcl in 95%乙醇 1.0.m solution in thf, mkseal 1.00mg/ml,介质:甲醇 1.0m in cyclohexane 1.0m in thf 1.0m solution in thf, mkseal 1.0mm 厚, 99.99% metals basis 1.0mm 直径, 退火,99.995% metals basis 1.0mm 直径,99.999% metals basis 1.0mm直径, 99.9% metals basis 1.0mol/l in thf, mkseal 1.0mol/l in thf 1.3 m solution in thf, mkseal 1.3 m solution in thf/toluene (62/38), mkseal 1.3%-1.5% in isopropanol 1.4 m solution in butyl diglyme, mkseal 1.4 m solution in thf,mkseal 1.45m solution in butyl diglyme, mkseal 1.4m solution in thf, mkseal 1.4m solution in toluene/thf, mkseal 1.5 m in h2o 1.5-2.0u/mg 1.5mm 直径, 退火,99.995% metals basis 1.6 m in thf, mkseal 1.6 m solution in hexanes, mkseal 1.6m in hexane ,mkseal 1.7 m solution in thf,mkseal 1.8 m solution in thf, mkseal 1.8 m solution in toluene, mkseal 1.9m solution in thf, mkseal 10 % 溶液 10 atom % 18o 10 mm/dmso 10 wt% in hexanes 10 wt. % in h2o 10 wt.% in 10 wt.% nitric acid, 99.999% trace metals basis 10 wt.% solution in toluene , mkseal 10 wt.% 基体:丙二醇 10% fe 10% in meoh 10% in propanediol 10% pd basis 10% pd(oh)2 10% solution in h2o 10% w/v in ethanol 10% w/v in isopropanol/toluene, 98% trace metals basis 10% w/w soln. in thf 10%于水中 10%的水溶液,约2.4mol l 10%的水溶液 10-30 nm, 25% in h2o 10-80% 10.0mg/ml,基体:纯水 100 mesh,99.9% 100 ng/ul于环己烷 100 nm 粒径, 20 wt. % 异丙醇溶液 100 μg/ml in acetonitrile 100 μg/ml in isooctane 10000 x in dmso 1000mg/l于叔丁基甲醚 1000ug/ml in purge and trap methanol 1000μg/ml, 溶于吹扫-捕集甲醇溶液中 1000分子量 100mg/l,溶剂:水 100mg/l于甲醇 100ppm 100ug/ml in methanol 100ug/ml,in methanol 100μg/ml in h2o 100μg/ml in methanol 100μg/ml 异辛烷溶液 100μg/ml, u(%)=2 , 介质:甲苯 100μg/ml,u(%)=2,介质:甲苯 100μg/ml,u=2%,介质:丙酮 100μg/ml,溶剂:甲醇 100μg/ml 100目 10mg/ml in ethanol 10m 10ug/ml in methanol 10μg/ml,u=3% 12% zr in mineral spirits 12-16目 12.0-14.5% fe basis 1250目 12醇:14醇=70:30,moa-3 12醇:14醇=70:30,moa-5 12醇:14醇=70:30,moa-9 13%于四氢呋喃中, 约0.8mol/l 13-14% active oxygen 14% in methanol,mkseal 14.5 - 16% wt.% 磷 15% mo 15-20wt. % in h2o, ≥99.99% trace metals basis 15.3% pt 150μm 15cm或更小, 99.999+% metals basis 17-23%钒 18 wt%二甲苯溶液 18 wt. % in h2o,含5-8% 甲醇稳定剂 18mm in acetone, for chiral derivatization 19-23% ce basis 19mm 或更小, 99% metals basis 1:1.5型 1:1比例 1m in hexanes 1m in methf 1m in water 1m solution in benzyl alcohol 1m solution in thf 1m thf 1mg/ml in methanol (:aqueous 10 mm nh4oh (7:3)), ≥90% (tlc) 1mg/ml in methanol (:aqueous 10 mm nh4oh (7:3)), ≥95% (tlc) 1mg/ml,基体:水 1mm 直径, 99.998+% metals basis 1mol/l in thf 1mol/l thf溶液 1mol/l 介质:h2o 1m 2 % cross-linked with divinylbenzene 2 m in thf, mkseal 2%水溶液 2-5mm (0.08-0.20in) 直径, 99.9999% (metals basis) 2-5um/99.5% 2.0 m in dmf 2.0 m in h2o 2.0 m in thf 2.0 m in toluene, mkseal 2.0 m solution in hexane, mkseal 2.0 m solution in hexanes 2.0 m solution in methanol,mkseal 2.0 m solution in thf ,mkseal 2.0 m solution in thf 2.0m solution in thf, mkseal 2.0mm 厚,99.9985% metals basis 2.0mm直径, 99.999% metals basis 2.5 m solution in hexanes, mkseal 2.5 m solution in thf, mkseal 2.8 m in 2-methyltetrahydrofuran, mkseal 2.8 m solution in 2-methyl-thf, mkseal 20 wt. % in 4% sulfuric acid 20 wt. % in ethanol 20 wt. % suspension in thf 20% in c6h5cl 20% in tetrahydrofuran, mkseal 20% in water 20% pd(oh)2 20% w/w乙醇溶液 20%,cod≥17万mg/l 20%水溶液 20%甲醇溶液,~20% in methanol (t) 20-100 micron 20-25% 乙醇溶液 20-30 nm 粒径, 20 wt. % 水溶液 20-40目 200-300 目 2000 u/ml 2000μg/ml in dichloromethane 2000μg/ml in methanol 200nm,99% 200亿cfu/克 20mm或更小, 99.9% (reo) 20nm 球形,99.5%,γ型 20nm-100nm,99.9% metals basis 20nm-50nm 球形,99.5% 20目 22-25% aqueous solution 22.5%水溶液 22mm (0.9in) 直径, 99+% (metals basis), sr ≤0.8% 24% in tetrahydrofuran, mkseal 2400分子量 25 wt.% 水溶液 25% in h2o 25% in meoh 25% in methanol 25%inisopropanol 25-28%, 蒸发残渣≤0.002% 25-28%, 蒸发残渣≤0.004% 25-30 wt. % 水溶液 25mg/5ml in pbs,非磁性,1um 27% 乙酸乙酯溶液 28% in water 28% k2o,粉末 2m in tetrahydrofuran(26-29wgt%) 2m 2um 2μm,医用级 3 wt.% 基体:丙二醇 3% nh3 in h2o 3-5mm,吸附剂,催化剂及载体 3.0 m solution in 2-methyl-thf, mkseal 3.0 m solution in thf, mkseal 3.175mm 直径 x 3.175mm 长, 99.9999% (metals basis) 3.175mm 直径 x 3.175mm 长,99.9999% metals basis 3.175mm 直径 x 6.35mm 长, 99.95% (metals basis去除ta) 3.4 m solution in 2-methyltetrahydrofuran, mkseal 3.4um 30 nm 粒径, 20 wt. % 异丙醇溶液 30 wt%甲醇溶液(ca. 5mol/l) 30% in h2o 30% solution in h2o 30%,cod≥25万mg/l 30%乙二醇溶液 30%水溶液 30%甲醇溶液 30±2% in h2o 30-35% in h2o 30-35%inwater 30-40wt. % in d2o, 98 atom % d 30.0% 30.6-39.0%cu 3000ppm 300目,99% 300目 30nm 球形 纯度>99.5% 30nm 球形,99.5%,α型 30nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 30nm,98%,α型 30nm,99.5% 30目,98% 31% in h2o 31wt.% phthalyl 32-36% 325目, 99.5% metals basis 33 wt.% solution in acetic acid, mkseal 33% in h2o, 99% (dry basis) 33-35% tio2 34-40%ca 35 wt. % in h2o 35 μg/ml in isooctane 35 μg/ml 异辛烷 35 μg/ml于异辛烷 35% pt basis 35%水溶液 35wt.% in h20 35wt.% in h2o 36%,固体 36.0-40.0% ru basis 36.00% 37 wt. % in h2o,含10-15% 甲醇稳定剂 39-44% b2o3 basis, 31-37% cao basis, powder 3m,ph4.5 3m,ph5.2 3mol/l in meoh 3m 4% ca 4% isopropanol 4-6mm,99.999% metals basis 4.15mm厚, 99.99% metals basis 4.5%(active oxygen) 4.5-6.5% (al) 40 cst 40 wt. % in h2o (8.8 m) 40 wt. % in h2o, 含0.01%的乙酸铵阻聚剂 40 wt.% in h2o 40% in h2o 40% w/w in water 40% w/w水溶液 40% 水溶液,即 2.6mol/l 40%+ in water 40%水溶液 40%溶液,电子级 40%甲醇溶液 40-47%mgo 40-60%,工业级 40-60目 gc 40.0 - 50.0 %甲醇溶液 40.5%-42.5% pb 40nm,99.5% metals basis 40nm,99.5% 42%~46% khso5 basis 43% napo3 43.6%(wt) in dichloromethane 44 wt. % in h2o 45% fecl3 basis in h2o 45%的水溶液 45-50%, soluble in isobutanol 45-50% 45.0 - 50.0% 45um,-325 目, 99.9% metals basis 45wt.% aqueous solution 46.00% 47.00% 48-50% ni basis,150μm 48-50% ni basis,425-850um 48-50%溶液 48~50% au basis 49 wt. % in 2-ethylhexanoic acid 4n,靶材专用 5 % 溶液 5% carboxyl basis 5% in h2o 5%溶液 5-10 nm 粒径, 20 wt. % 水溶液 5-10nm,自分散 5.0 m in 1 m naoh 5.00% 5.4mg/l,1-5层 50 wt. % in mineral spirits 50 wt. % in pentane 50 wt. % 水溶液 50 wt. %水溶液 50% h2o 50% in 2-ethylhexanoic acid 50% in chlorocyclohexane 50% in dichloromethane 50% in ea 50% in methanol 50% in thf, mkseal 50% in toluene 50% in triacetin, stabilized 50% pt basis 50% w/w 水溶液, 试剂级 50% w/w水溶液 50% 水溶液 50%+ in water 50%inisopropanol 50%involatilesilicone 50%inxylene 50%水溶液,含磷酸稳定剂≤2% 50%甲醇溶液 50%邻苯二甲酸二辛酯溶液 50-55% w/w hbf4 50-60%的水溶液 50-70% 50.00%水溶液 50000 ug/ml in dichloromethane 50mg/l于乙腈(以醛酮计) 50nm 近球形,99.5% 50nm,20-30% in water 50nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 50nm,40 wt. % in h2o 50nm,40 wt. % 异丙醇 50nm,50 wt. % in h2o 50nm,99% 50nm,球形, 99.9% metals basis 50wt%水溶液 50wt.% in h20 55% in water 55%, soluble in isobutanol 55%,外消旋和内消旋的混和物 55-60 wt% bf3 55.0 - 58.0 % 55.00% 59.00% 595ug/mg 5mg/l in methanol 5mm (0.2in) 直径,99.995% (metals basis) 5mm 或更小, 99.9999% metals basis 5mm 直径,99.995% metals basis 5mm 直径,99.999% metals basis 5mm 直径,99.9999% metals basis 5m 5um/99.5% 6 wt. % (on silica gel) 6-14% active chlorine basis 6.35mm 厚, 99.9% metals basis 60 wt. % in h2o 60 wt. % 水溶液 60 wt. %水溶液 60% in heptane, ca. 1.7 mol/l, mkseal 60% in heptane,ca. 1.7mol/l 60% in water,300-500ppm mehq 60% in water 60% w/w in water 60% 水溶液 60%,gc 60%-70% 60%正己烷溶液, ca. 1.7mol/l 60%溶液 60-200目 60-80目 gc 60.8 - 74.3 % tin 600目 60mesh 60nm 球形 纯度>99.5% 60nm 球形,98.0% 60nm,99.9% metals basis 61%min in mineral spirits ,pb 24% 62 wt. % in h2o 64-66%的水溶液 65 % water 65 wt. % in mineral spirits 65% in ethanol 65% in etoh 65%,lc 65%,混合物 65-72% in water 65wt% in h2o 68-70% 6mm 直径, 99.99999% metals basis 6mm 直径,99.9% metals basis 7-8 wt. % in methanol 7-9% 7.5% w/w p2o5 70 wt%甲苯溶液 70 wt. % 正丙醇溶液 70% (hplc) 70% in etoh 70% 水溶液 70%,含异构体和邻苯二甲酸 70%,含稳定剂铜屑 70%in water 70%溶液 70%甲醇溶液 70%的水溶液,约7.3mol 70-75% in heptane 70wt. % in h2o 73%,含约20%的2-溴-1-丁醇 74%,光球状,3-5mm 74%,片状 74-76% in water 75 wt. % in h2o 75% (contains ca. 23% isomer) 75%(gc) 75%(v/v),消毒用 75%,含稳定剂mgo 75%异丙醇溶液 75%水溶液 7500 8 wt. % in h2o 80 % in water 80 wt. % in h2o, contains 600 ppm monomethyl ether hydroquinone as inhibitor 80 wt.%,含benzoic acid ,isophtalic acid 稳定剂 80% (contains 5% phenol at maximum) 80% (hplc) 80% ethanol solution 80% in ethanol 80% in h2o 80% in water 80% 水溶胶 80%,gc 80%,含2,6-异构体 80%,天然 80%-85% 80-100目 gc 800目 83%,gc 85% (t) 85% in hexamethyldisiloxane 85% in water 85%, cont. ca 10% 2-cyclohexylidenecyclohexanone 85%,gc 85%,stabilized with tbc 85%,其余物为2-氯代萘 85%,含100ppm mehq稳定剂 85%,工业级 85-90%,工业级 85.0%,gc 86.00% 87%,顺反异构体混和物 87.00% 88% (m- and p- mixture)(stabilized with tbc + onp + o-nitrocresol) 88.5% (hplc) 8m 9.5mm 直径,99.97% metals basis 90% (hplc),用于荧光分析 90% (t) 90% stabilized with 60-100 ppm mehq 90% technical grade 90%(gc) 90%(mixture of isomers) 90%(nmr) 90%(stabilized with tbc) 90%(t) 90%(tbc作为稳定剂) 90%(total of isomer) 90%, γ型 90%, 异构体混合物 90%, 来源于鲨鱼 90%,5-和6-异构体混合物 90%,gc 90%,lc 90%,nmr 90%,stabilized with tbc+2-nitro-p-cresol 90%,含有10-(4-碘苯基)吩噻嗪的最大值为10% 90%,工业级 90%,异构体的混合物 90%,溶于水 90%,顺反异构体混和物 90.0% (hplc) 90nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 91%,≤10% dichloromethane 92%(gc) 92-94 % 92-94% 93%,gc 93%,lc 93%,t 93%,含200 ppm tbc 阻聚剂 93%,含稳定剂吩噻嗪 93%,外消旋和内消旋混合物 93%,异构体混合物 93%,黄相 93%固含量,5%-7%的甲苯 94%(gc) 94%(hplc) 94%,刺球状,1-3mm 94%,含0.2% topanol 稳定剂 94%,含mehq稳定剂 95 atom% 95% (contains <6%solvent) 95% (contains h2o) 95% (h-nmr) 95% (mix) 95% (stabilized with 1%bht) 95% (stabilized with copper chip) 95% (tlc) 95% anhydrous basis 95% containing less than 10% ea 95% hplc 95% stabilized with tbc 95%(mixture) 95%(nmr) 95%(stabilized with bht) 95%(stabilized with copper chip) 95%(stabilized with dcm) 95%(stabilized with k2co3) 95%(含有<3%h2o) 95%(含水约50%,单位重量以干重计) 95%(含碳酸钾稳定剂) 95%(含约40%的十八烷基醚硫酸钠) 95%, ≤1.0% water 95%, 0.1% 4-甲氧基苯酚稳定剂 95%, 20% in water 95%, 200ppm 4-甲氧基苯酚稳定剂 95%, 98%ee 95%, mixture of isomers 95%, 含k2co3稳定剂 95%, 含有稳定剂mehq 95%, 异构体混合物(反式为主) 95%,(e)+(z) 95%,(双酯≥75%,单酯≥20%) 95%,100目 95%,1m solution in water 95%,200-300目 95%,5-10% branched isomers 95%,ee 98% 95%,ee98% 95%,fe 21% min 95%,lc&t 95%,lc 95%,stabilized with 60-100 ppm mehq 95%,stabilized with mehq 95%,trans-isomer >92% 95%,t 95%,含0.01 % 柠檬酸稳定剂 95%,含0.2% sodium carbonate 稳定剂 95%,含100-500 ppm tbc稳定剂 95%,含100ppm mehq稳定剂 95%,含200ppm mehq稳定剂 95%,含250ppm bht 稳定剂 95%,含≤3%二氯甲烷 95%,含稳定剂mehq 95%,含稳定剂tbc 95%,固体 95%,对映体混合物, 主要是(s)-型 95%,异构体的混合物 95%,蓝相 95%,颗粒状 95%mixtbcasstabilizer 95.0 % gc 95.0% (gc) 95.0% (qnmr) 95.0%(total of isomers) 95 96 atom % d, 98% (cp) 96% (hplc) 96% (predominantly (s-)) 96% (tlc) 96% ,含80- 120 ppm hydroquinone 稳定剂 96% dry weight,5-10% 甲醇做稳定剂 96%(gc) 96%(mixture of isomers) 96%(mixture of tautomers) 96%(stabilized with tbc) 96%(酯含量) 96%, mkseal 96%, 含有200 ppm mehq阻聚剂 96%, 大约200ppm bht 稳定剂 96%,(99% ee) 96%,5-和6-异构体混合物 96%,sum of branched isomer,0.01% mehq 96%,t 96%,上层覆保护剂 96%,含200 ppm mehq 稳定剂 96%,含250ppmmehq稳定剂 96%,含30 - 70 ppm mehq 稳定剂 96%,含30%水作为稳定剂 96%,含稳定剂铜屑 96%,异构体混合物 96%,混合构型 96%,溶于油 96%,片状 96.0% (gc) 96.0% (tlc) 96.0%(gc) 96.5% (gc) 97 atom % 18o 97 atom % d, 96% (cp) 97 atom % d,98% (cp) 97% +(hplc)(t)(contains <10%h2o) 97% 25-27% solution in ethyl acetate 97%(contains of anhydride) 97%(mix) 97%(mixture) 97%(nmr) 97%(s)-binapine 97%(stab. with hydroquinone) 97%(stabilized with copper chip) 97%(stabilized with mehq) 97%(tbc作为稳定剂) 97%(wetted with ca. 30% xylene) 97%(含200-300ppmmehq稳定剂) 97%(基于干物质)in 25% h2o 97%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 97%, (e)+(z) 97%, 0.05%的对叔丁基邻苯二酚作稳定剂 97%, 30-45kda 97%, 4-叔-丁基邻苯二酚 稳定剂 97%, mixture of 2- and 4-isomers 97%, mixture of isomers 97%, sum of c16 c18 c20 97%, water ca 10% 97%, 含0.1% koh稳定剂 97%, 含有稳定剂mehq 97%, 含稳定剂mehq 97%, 含稳定剂tbc 97%, 含铜稳定剂 97%, 约含150ppm 4-甲氧基苯酚稳定剂 97%, 颗粒 97%,0.01% 氢醌稳定剂 97%,0.1% 对叔丁基邻苯二酚作稳定剂 97%,10%h2o 97%,10mg/ml solution in water 97%,1μm 97%,300目 97%,40-100kda 97%,99% ee 97%,bet surface area 8~16 m2/g 97%,cis- and trans- mixture 97%,ee97% 97%,ee值98% 97%,ee值≥98% 97%,gc&t 97%,lc&t 97%,n 97%,pd 10% 97%,stab. with <1% magnesium oxide 97%,stabilized with bht 97%,sum of enantiomers 97%,t 97%,water≤50 ppm (by k.f.), mkseal 97%,含0.02% 4-methoxyphenol 稳定剂 97%,含0.05% bht 稳定剂 97%,含0.05% 四溴双酚a 稳定剂 97%,含0.1 % 对苯二酚 稳定剂 97%,含0.1% tbc稳定剂 97%,含0.1%对叔丁基邻苯二酚(tbc)稳定剂 97%,含100-200ppm bht稳定剂 97%,含100ppm bht稳定剂 97%,含100ppmmehq稳定剂 97%,含60-100ppm bht稳定剂 97%,含tbc稳定剂 97%,含低聚物 97%,含含稳定剂氢醌 97%,含稳定剂hq 97%,含稳定剂mehq 97%,含稳定剂mgo 97%,含稳定剂tbc 97%,含稳定剂水滑石 97%,含铜作稳定剂 97%,混合物 97%,片状 97%,顺反异构体 97%,顺反异构体混合物 97%,顺反异构体混和物 97%,顺反混合物 97%,顺式 + 反式 97%,香料级 97%提供的是频那醇酯 97.0 % gc 97.0% (nt) 97.0% (sum of isomers, gc) 97.0% (tlc) 97.0%(hplc) 97.0-103.0% (nt) 97.00%盐酸盐 97.5% (gc) 97.500% 98 atom % 13c, 95% (cp) 98 atom % 13c, 98% (cp) 98 atom % 15n, 99 atom % 13c 98 atom % d, 99 atom % 13c 98 atom % d,95% 98 atom %, ≥97% (cp) 98 atom %13c, 95% (cp) 98 atom %13c, 99% (cp) 98 atom % 98 atom% 15n 98 atom% d,99%(cp) 98 atom% d 98 atom%d 98% stabilized with tbc 98% (as sncl4) 98% (contains <1%h2o) 98% (gc) 98% (mix) 98% (only trans) 98% (tlc) 98% ,ee98% 98% ,含5-10 ppm tert-butylcatechol 稳定剂 98% contains ca. 11% dioxane 98% dry weight 98% ir 53% 98% mixture of isomers 98% trace metals basis excluding zr 98% trace metals basis 98% 镍42% 98%(contains of anhydride) 98%(gc&t) 98%(m- and p- mixture)(stabilized with tbc) 98%(mix2%ea) 98%(mixture of cis and trans) 98%(mixture of isomeric branched chain hexanes) 98%(stabilized with bht) 98%(stabilized with methylhydroquinone) 98%(t) 98%(~36% bf3 basis) 98%(混合异构体) 98%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%, 98 atom%d 98%, contains 10 wt.% water as stabilizer 98%, ee80% 98%, ee99% 98%, in 10% dcm 98%, stab. with 1-5% hexane 98%, stabilized with mehq 98%, stabilized with tbc 98%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%, ~20nm 98%, 含k2co3稳定剂 98%, 含铜屑稳定剂 98%, 粉末 98%, 顺反混合物 98%,(stabilized with mehq) 98%,(t) 98%,10-20目 98%,100ug/mlinmethanol｜1ml 98%,1250目 98%,200目 98%,300目 98%,4 ~ 8μm 98%,40-60目 98%,400目 98%,42-50(mpa25°c) 98%,98%atom%d 98%,99%e.e. 98%,co:45-47% 98%,contains 0.1-0.2%mehq 98%,contains≤6%h2o 98%,contains≤7%h2o 98%,ee 99% 98%,ee92% 98%,ee95% 98%,gc&n 98%,hplc 98%,m.w ~80000 98%,mix tbc as stabilizer 98%,mixture of cis and trans 98%,pd 15% 98%,pd>13.3% 98%,pd>15.5% 98%,pd>19.0% 98%,pd>21.0% 98%,pd>22.5% 98%,pd>29.0% 98%,pd>36.2% 98%,pt:55.0 ± 1.3% 98%,rh>42% 98%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 98%,stabilized with copper chip 98%,stabilized with hq 98%,stabilized with tbc 98%, 98%,光学纯 70% 98%,光学纯 98%,含 o-型 98%,含0.01% koh稳定剂 98%,含0.1% 对苯二酚稳定剂 98%,含0.1%碳酸钾稳定剂 98%,含0.10% alpha-tocopherol 抗氧化剂 98%,含0.3 % mgo稳定剂 98%,含50 - 100 ppm bht 稳定剂 98%,含500 ppm bht稳定剂 98%,含90 - 110 ppm mehq 稳定剂 98%,含有数量不等的1,3-二异丙基咪唑鎓-2-羧酸盐 98%,含水约20% ,单位重量以干重计 98%,含稳定剂bht 98%,含稳定剂吩噻嗪 98%,含铜屑稳定剂 98%,支链异构体类的混和物 98%,无水 98%,无色液体 98%,棕色结晶粉末 98%,深蓝紫色结晶粉末 98%,用于过氧化物酶试验 98%,磺酸掺杂 98%,蓝相 98%,适用于荧光 98%,非对映异构体混合物 98%,顺反异构体混合物 98%,黄相 98%atom%d 98%含稳定剂mehq 98%混合(tbc作为稳定剂) 98%混合物(tbc作为稳定剂) 98-101% 98-102%(t)(含有30-40%h2o) 98.0% (at) 98.0% (tlc) 98.0%(hplc) 98.0%(tlc) 98.00%-gc&t 98.00%lc&n 98.00%lc 98.5 atom %, 15n 98% 98.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98.5%, mixture of isomers 98.5%,water≤50 ppm (by k.f.), mkseal 98.5-101.5% (at) 98.9-101.2% b2o3 basis 98atom %d 99 atom % 11b 99 atom % 13c, 98 atom % 15n 99 atom % 13c, 98 atom % d 99 atom % 13c, 99 atom % d 99 atom % 13c, 99% (cp) 99% (dry wt.), water <2% 99% (gc) 99% (hplc), 98% 99% (purity excludes ~1% zr) 99% (tlc) 99% 10-50微米 99% au assay:39.91 ± 0.8% 99% isotopic 99% metals basis,2-10 μm 99% metals basis,pd 9.0% 99% mix tbc as stabilizer 99% purity,>99% ee 99%(99.99 %-ta) 99%(99.99%-w) 99%(hplc) 99%(二甲苯异构体+乙基苯) 99%(升华级) 99%(含200-300ppmmehq稳定剂) 99%(天然) 99%(支链异构体类的混合物总和) 99%+ 99%, water≤50 ppm (by k.f.),mkseal 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99%, 0.1-1mm 99%, 1-3mm 99%, 2-4mm 99%, 200目 99%, 4-7mm 99%, mixture 99%, with molecular sieves, stabilized with 400 ppm triethylamine, water≤50 ppm (by k.f.), mkseal 99%, with molecular sieves,water≤50 ppm (by k.f.), mkseal 99%, β型 99%, ≥99.99% trace metals basis 99%, 异构体混合物 99%, 粒径<10μm 99%,(99% ee) 99%,(mixture of isomers) 99%,0.1%单杂 99%,0.5~0.7um 99%,100目 99%,15nm,疏水性 99%,200目 99%,325 目,粉末 99%,40-60目 99%,500目 99%,50目 99%,6μm 99%,99.99%-hf, <0.2% 99%,anhydride group content≥41.0% 99%,bp 99%,ee 98% 99%,ee99% 99%,mixture of isomers 99%,mkseal 99%,p≥27% 99%,ru:46% 99%,stabilized with 100ppm mehq,water≤50 ppm (by k.f.),mkseal 99%,stabilized with 400 ppm triethylamine, water≤50 ppm (by k.f.), mkseal 99%,stabilized with bht, water:300-500ppm (by k.f.), mkseal 99%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99%,water≤50 ppm (by k.f.), mkseal 99%,十二水合物 99%,单杂<0.2%,ee99.5% 99%,含0.01 % bht 稳定剂 99%,含0.01% copper 稳定剂 99%,含0.01% 铜片 稳定剂 99%,含0.1 % koh 稳定剂 99%,含1-3%乙醇稳定剂 99%,含10 - 20 ppm mehq 稳定剂 99%,含10-100ppm 4-methoxyphenol 稳定剂 99%,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 99%,含10-20 ppm mehq 作为稳定剂 99%,含15 - 20 ppm mehq稳定剂 99%,含150-400 ppm bht 稳定剂 99%,含20ppm mehq稳定剂 99%,含50-150 ppm tbc 稳定剂 99%,含50ppm bht 稳定剂 99%,含水20% 99%,含阻聚剂mehq 99%,异构体混合物 99%,异构体的混合物 99%,总杂<0.1% 99%,来源枯草菌脂肽钠 99%,水分≤1.0% 99%,粒径<1.2um 99%,粒状 99%,金红石,2-3um 99%,锐钛,100nm 99%,锐钛,2-3um 99%,闪烁级 99%,高纯级 99%,黄色到棕色粉末 99%,黄色结晶针状固体 99+% 99.0% (at) 99.0% (hplc) 99.0% (t) 99.0% metals basis 99.0%(hplc) 99.0-100.5% (in dried substance), meets analytical specification of e 282 99.00%,ee99% 99.5 atom % d, 99% (cp) 99.5% (metals basis 去除ni), ni <0.2% 99.5% (metals basis 去除铪) ,325目 99.5% (metals basis) 99.5% (metals basis,锆除外), zr <1% 99.5% (reo) 99.5% ,粒径:1-2um 99.5% metals basis,<100 nm 99.5% metals basis,10μm 99.5% metals basis,2.0μm 99.5% metals basis,25μm 99.5% metals basis,2μm 99.5% metals basis,300目 99.5% metals basis,5 μm 99.5% metals basis,粉末, 2 μm 99.5% metals basis,粉末,<3 μm 99.5% trace metals basis excluding hf 99.5%, water≤50 ppm (by k.f.),mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.5%, hafnium chloride<50ppm 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%,100-200nm,球形 99.5%,100-200nm 99.5%,100nm 99.5%,10um 99.5%,15±5nm 99.5%,150-200目 99.5%,2-3μm 99.5%,20±5nm 99.5%,20-80nm 99.5%,200nm 99.5%,200目 99.5%,20nm 99.5%,30±5nm 99.5%,300目 99.5%,50±5nm 99.5%,500nm 99.5%,50nm 99.5%,60-120nm 99.5%,ee99.5% 99.5%,gc 99.5%,metals basis 99.5%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.5%,trace metals basis 99.5%,water< 0.005% (by k.f.), mkseal 99.5%,water≤50 ppm (by k.f.),mkseal 99.5%,with molecular sieves, stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.5%,with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.5%,≤3 μm 99.5%,升华纯化 99.5%,单杂<0.1% 99.5%,含0.1 % koh 稳定剂 99.5%,含稳定剂铜屑 99.5%,异构体混合物 99.5%,生物技术级 99.5%,粉末 99.5%分析标准品 99.56%,无水级 99.6%,25μm 99.7% metal basis 99.7% trace metals basis 99.7%,stabilized with bht, water≤50 ppm (by k.f.),mkseal 99.7%,water≤50 ppm (by k.f.), mkseal 99.7%,with molecular sieves, stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.7%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.8% (metals basis) 99.8% metals basis, 100目 99.8% metals basis,100nm,金红,亲水 99.8% metals basis,100nm,金红,亲油 99.8% metals basis,100nm,锐钛,亲水 99.8% metals basis,100nm,锐钛,亲油 99.8% metals basis,25nm,金红,亲水 99.8% metals basis,25nm,锐钛,亲水 99.8% metals basis,300目 99.8% metals basis,40nm,金红,亲水 99.8% metals basis,40nm,锐钛,亲水 99.8% metals basis,5-10nm,锐钛,亲水亲油型 99.8% metals basis,5-10nm,锐钛,亲水型 99.8% metals basis,50±10nm 99.8% metals basis,60nm,金红,亲水 99.8% metals basis,60nm,锐钛,亲水 99.8% metals basis,60nm 99.8% metals basis,90±10nm 99.8% metals basis,rh 81% 99.8% trace metals basis 99.8%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.8%, cl≤0.005% 99.8%,10μm 99.8%,1μm,,高白度 99.8%,200目 99.8%,pb:0.0005% 99.8%,pb:0.001% 99.8%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.8%,water≤30 ppm (by k.f.), mkseal 99.8%,比表面积(bet):100m2/g;粒径:7-40nm 99.8%,比表面积(bet):115m2/g;粒径:7-40nm 99.8%,比表面积(bet):120m2/g;粒径:7-40nm 99.8%,比表面积(bet):150m2/g;粒径:7-40nm 99.8%,比表面积(bet):170m2/g;粒径:7-40nm 99.8%,比表面积(bet):200m2/g;氯化物:0.0125 99.8%,比表面积(bet):200m2/g;粒径:7-40nm 99.8%,比表面积(bet):230m2/g;粒径:7-40nm 99.8%,比表面积(bet):300m2/g;粒径:7-40nm 99.8%,比表面积(bet):380m2/g;粒径:7-40nm 99.85% (metals basis) 99.8500% 99.9 %,~60% in neodecanoic acid (15-20% bi) 99.9 atom % d 99.9% metals basis, ≤1μm 99.9% (metals basis), pt 44.9% min 99.9% metals basis ,无水 99.9% metals basis, 1000目 99.9% metals basis, 500目 99.9% metals basis, 600目 99.9% metals basis, 800目 99.9% metals basis, 900目 99.9% metals basis, ≤0.8μm 99.9% metals basis,0.5μm 99.9% metals basis,1-2μm 99.9% metals basis,1-5μm 99.9% metals basis,10-30nm 99.9% metals basis,100-200 mesh 99.9% metals basis,100目 99.9% metals basis,1~2μm 99.9% metals basis,1μm 99.9% metals basis,2 μm 99.9% metals basis,2-3μm 99.9% metals basis,200目,粉末 99.9% metals basis,30±10nm 99.9% metals basis,300目,近球形 99.9% metals basis,30nm 99.9% metals basis,40nm 99.9% metals basis,4mm,颗粒 99.9% metals basis,50-70nm 99.9% metals basis,500nm 99.9% metals basis,5~10μm 99.9% metals basis,60-100nm,黑色粉末 99.9% metals basis,60-100nm 99.9% metals basis,<200nm 99.9% metals basis,ir ≥84.5% 99.9% metals basis,pd 29% 99.9% metals basis,α相,30nm,亲水型 99.9% metals basis,α相,30nm,亲油型 99.9% metals basis,不规则片状 99.9% metals basis,宽:13 mm, 厚:0.3 mm 99.9% metals basis,无水 99.9% metals basis,粉末,100-200 mesh 99.9% metals basis,粉末,≥200目 99.9% metals basis,粒径<5mm 99.9% metals basis,粒径(d50)10-20μm 99.9% metals basis,粒径10μm 99.9% metals basis,粒径≤1μm 99.9% metals basis,颗粒 99.9% metals basis,黄色 99.9% rare earth metals basis,200目 99.9% trace metals basis (purity excludes ~2% hfo2) 99.9% trace metals basis, 1-10μm 99.9%(gc),含40ppm二异丙胺 稳定剂 99.9%, 200目, 四方相 99.9%, 20nm 99.9%, 不含甲醇 99.9%, 无甲醇、无甲醛、无酯、无杂醇油 99.9%, 深蓝色, 用作透明隔热薄膜 99.9%, 球型, d50=0.6-1um, 四方晶体-铁电体 99.9%, 球型, d50=0.6-1um 99.9%, 白色 99.9%,1-2um 99.9%,1-3um 99.9%,100nm 99.9%,105-250um 99.9%,1250目 99.9%,12~16um 99.9%,15-45um 99.9%,15-53um 99.9%,17um 99.9%,1~5mm 99.9%,23um 99.9%,27um 99.9%,300目 99.9%,30nm 99.9%,325目 99.9%,3~4um 99.9%,40nm 99.9%,500目 99.9%,53-105um 99.9%,53-120um 99.9%,53-150um 99.9%,800目 99.9%,8~10um 99.9%,d50(0.2~0.55μm) 99.9%,metals basis 99.9%,total metallic impuriyies≤1000 ppm 99.9%,water≤50 ppm (by k.f.), mkseal 99.9%,比表面积≥120m2/g;粒径:30nm 99.9%,生物技术级 99.9%,粒径:1-3μm 99.9%,颗粒,锆≤0.15% 99.9%-ni 99.9%metal basis,d1=1μm 99.9%metals basis 99.95% metals basis 99.95% (metals basis), pt 51.5% min 99.95% metal basis 99.95% metals basis ,白色 99.95% metals basis, os 37%最低 99.95% metals basis, rh 13.5% 最低 99.95% metals basis, 钌 10.2% 最低 99.95% metals basis,1-5mm 99.95%,1um 99.97% metals basis 99.99 % metals basis 99.99% (metals basis), au 84.2% 最低 99.99% metal basis, 无气味的粉末 99.99% metals basis ,50nm 99.99% metals basis 0.5-2mm 99.99% metals basis, 40目 99.99% metals basis, 800目 99.99% metals basis, au>=39.3%最低 99.99% metals basis, rh 46.2% 最低 99.99% metals basis, γ相, 40nm 99.99% metals basis,0.1mm 直径 99.99% metals basis,0.25mm 直径 99.99% metals basis,0.5mm 直径 99.99% metals basis,0.5um 99.99% metals basis,1-3mm,powder 99.99% metals basis,1-3mm 99.99% metals basis,100nm 99.99% metals basis,1mm 直径 99.99% metals basis,1um 99.99% metals basis,200nm 99.99% metals basis,2~10μm 99.99% metals basis,2μm 99.99% metals basis,300目 99.99% metals basis,40-200目 99.99% metals basis,4mm颗粒 99.99% metals basis,50-70nm 99.99% metals basis,5μm 99.99% metals basis,80%α相,30nm-50nm 99.99% metals basis,α晶型约90%,晶型γ约10%,50nm 99.99% metals basis,α晶型约90%,晶型γ约10%,60nm 99.99% metals basis,α晶型约95%,晶型γ约5%,80nm 99.99% metals basis,α相,300nm,亲水型 99.99% metals basis,α相,30nm,亲水型 99.99% metals basis,α相,30nm 99.99% metals basis,α相,50nm,亲水型 99.99% metals basis,γ相,10nm 99.99% metals basis,≤0.1μm 99.99% metals basis,≥100目 99.99% metals basis,不规则块状 99.99% metals basis,主体晶相,30nm-50nm 99.99% metals basis,无水级 99.99% metals basis,晶体颗粒 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型γ,20nm 99.99% metals basis,晶粒 99.99% metals basis,用于光学玻璃或单晶 99.99% metals basis,粒径<5mm 99.99% metals basis,粒径:10μm 99.99% metals basis,粒径:2μm 99.99% metals basis,粒径:5μm 99.99% metals basis,粒状,1-3mm 99.99% trace metals basis (purity excludes zirconium) 99.99% trace metals 99.99%(metalsbasis去除ni),ni<0.2% 99.99%, 1μm 99.99%, 2um 99.99%,1-3mm 99.99%,1-3μm 99.99%,1~5mm 99.99%,3-5 um 99.99%,4n 99.99%,metals basis 99.99%,water:0.5-0.8% 99.99%,白色粉末,锆≤0.15% 99.99%,粒径:1μm 99.99%-sn 99.99%-zr (reo) 99.99%metals basis 99.99%metalsbasis 99.995 % metals basis 99.9965% metals basis 99.998% (metals basis 去除 w), w 300ppm 最高 99.998% metals basis,100目 99.998% trace metals basis 99.99800% 99.9985% (metals basis), (去除最高25ppm的碱土金属) 99.999% (reo) 99.999% metals basis, 1-6mm 99.999% metals basis, 60目 99.999% metals basis, si 10ppm 最高 99.999% metals basis,1-5mm 99.999% metals basis,1-6 mm,beads 99.999% metals basis,300目 99.999% metals basis,beads,1-6 mm 99.999% metals basis,powder 99.999% metals basis,粒状,1-3mm 99.999%(metalsbasis去除ni),ni<0.2% 99.999%,5n 99.999%metals basis 99.9995% trace metals basis 99.9999% metals basis,1-5mm 99.9999% metals basis,单晶棒状 99.9999% trace metals basis 99.999900% 99.99999% metals basis,块状 99.99999% metals basis,棒状或块状 995-1005 ug/ml v(3+) 的 2% hno3溶液(20°c) 99atom%13c <100nm,99% >40% in h2o >65% >70% >80% >90% >97%(hplc) >99.0% metals basis,2μm acid terminated,lactide:glycolide 50:50,mw 24000-38000 acid terminated,lactide:glycolide 50:50,mw 38000-54000 acid terminated,lactide:glycolide 75:25,mw 4000-15000 acid terminated,mw 38000-54000 acid terminated,mw 7000-17000 acs reagent, chips, 33.5-36.5% acs reagent, for spectrophotometric det. of cd,cu,hg,pb,zn, ≥98%(tlc) acs reagent,99% acs spectrophotometric grade, ≥99.9% acs, 99% acs, pt 37.5% min acs, ≥85% acs, ≥98.0% (rt) acs, ≥99% acs, ≥99.0% (gc) acs, ≥99.4% acs, ≥99.5% acs, 干燥剂 acs,>98% acs,48% acs,97%,片状 acs,98% acs,98.0-102.0% acs,98.0-103.0% acs,99.0% acs,99.0-101% acs,99.5-101.0% acs,≥97.0% acs,≥99.0%(gc) acs,≥99.5%(gc) acs,≥99.7% acs,≥99.8% al2o3:46% al2o3≈32% al2o3≥30% alkylating agent, 90% al≥16% analytical standard ≥ 99.0 % analytical standard ≥99.0% (gc) analytical standard ≥97.0% (hplc) analytical standard, for gpc, 17,000 analytical standard,≥98% anhydrous(99.999%-ga)puratrem anhydrous, 99.5% anhydrous, powder, 99.9% metals basis anhydrous,99.0% anhydrous,99.9% trace rare earth metals basis anhydrous,99.995% trace metals basis anhydrous,99.998% trace metals basis anhydrous,≥99% anhydrous aps≈2微米, 99.9% metals basis ar 98% ar 85% ar 99.0% ar 99.5% ar, 25%水溶液 ar, 325目, 白色 ar, 98% ar, 99.0%,白色晶体 ar, so2≥6% ar, ≥75 wt. % in h2o ar, ≥85 wt. % in h2o ar, 含~75 ppm bht稳定剂 ar,>97.0%(gc) ar,>98.0%(gc) ar,>98.5%(gc) ar,>99.0%(t) ar,10-15ppm tbc as stabilizer ar,100nm ar,2000目 ar,25%甲醇溶液 ar,40 wt. % in h2o ar,40% ar,40-45% mgo basis ar,40.0% ar,54-57% cu basis ar,55.3% sno2 ar,57.5% ar,85% ar,85-90% ar,85.0% ar,92% ar,95 % ar,96.5% ar,97.0 % ar,98%,含3%乙醇稳定剂 ar,98.5 % ar,98.5%(gc) ar,99% metals basis ar,99%,含10ppm bht稳定剂 ar,99.0%,含40ppm二异丙胺 稳定剂 ar,99.5% metals basis ar,99.5%,低温煅烧 ar,99.5%,粉末 ar,99.7% ar,co 13.5~14.5% ar,co 43.0 - 47.0 % ar,fe 21-23 % ar,mg 4.0-5.0% ar,mn >47% ar,pd 46.0 - 48.0 % ar,pt ≥37.5% ar,≥47.0%,含≤1.5 % h3po2 稳定剂 ar,≥60% ar,≥80%,gc ar,≥85.0% moo3 basis ar,≥98.0%((hplc)) ar,≥98.0% ar,≥98.5 %(gc) ar,≥99 % ar,≥99% (titration) ar,≥99.0%(rt) ar,≥99.5%(gc) ar,≥99.5%,200目 ar,块状 ar,异构体混合物 ar,无水级 ar,模数:2.00-2.20 ar,模数:2.30-2.50 ar,模数:2.80-3.00 ar,模数:3.10-3.40 ar,白色粉末 ar.98.0% au 48-50% au ≥48% au≥51% au≥82% available chlorine 4.0 % available chlorine 5.5~6.5% average mn 1,700-3,200 average mn 10,000, contains mehq as inhibitor average mn 1310 average mn 2,000 average mn 20,000, contains mehq as inhibitor average mn 200, contains mehq as inhibitor average mn 40,000 average mn 400, contains mehq as inhibitor average mn 45,000 average mn 50,000 average mn 550, contains 270-330 ppm bht as inhibitor, 80-120 ppm mehq as inhibitor average mn 6,000, contains 1000 ppm 4-methoxyphenol as inhibitor average mn 600, contains mehq as inhibitor average mn 600 average mn 750, contains 900-1100 ppm mehq as inhibitor average mn 80,000 average mn ~1,000 average mn ~2,600 average mn ~27,000 average mn ~50000 by gpc average mn ~512 average mn ~670, average mw ~700 average mn ~683 average mn2,000 average mn3,700, contains ≤1,500ppm hq as inhibitor average mn~1,000 average mn~314, contains 300ppm mehq as inhibitor average mn~428 average mn~432,84wt.% in 1-butanol average mn~460, crystalline average mn~50,000 average mn~692,含100ppm mehq稳定剂 average mn~912 average mol wt 80,000 average mw 1000-1500 average mw 1200-1600 average mw 1200-2500 average mw 1400-1600 average mw 1500-1800 average mw 3,000, 50 wt. % in h2o average mw 3000-5000 average mw 4000-7000 average mw 550-650 average mw 570-620 average mw 600-1000 average mw 600-800 average mw 6000-8000 average mw 650-1000 average mw 700-1000 average mw 800-1400 average mw 8000-10000 average mw ~(162.21)n, 米黄色 average mw ~(162.21)n average mw ~1,589 average mw ~1000000, powder average mw ~14,000, average mn ~10,000 average mw ~160,000 average mw ~165,000 by gpc, acrylonitrile 25 wt. %, pellets average mw ~185,000 by gpc, acrylonitrile 30 wt. %, powder average mw ~216000, average mn ~80,000 average mw ~35,000, pellets average mw ~40,000 by gpc average mw ~60,000 average mw ~70000, powder average mw~2,200, average mn~1,200, allyl alcohol 40mol % ba ≥30.0 % basichydrate battery grade 99.99% trace metals basis bf3 ≥19% bf3 ≥60%, 白色固体 bf3: 25%-26% bf3: 34%-36% bf3: 40% bf3:17.5 - 19.0 % bf3:30.0 - 35.0 % bi 49% biochemika, >= 96.0 % tlc biochemika, ≥99% biological stain bioreagent, suitable for fluorescence, ≥98.0% (t) biothnology grade ,80% bioxtra, ≥98.0% (tlc) black granular br,10-20u/mg br,28% br,90% br,99% c10-hsl,ahl信号分子 c14-c17混标,52% cl,100ppm溶于环己烷 标准品 10ml c16:54%-62%;c18:38%-44% c18:80-90% ca 6.6-7.4% ca. 10% in isopropyl ether,mkseal ca. 10% weight in thf ca. 45% in water ca. 50% in water cabot vulcan xc-72 carbon (anhydrous) 46.0 - 48.8 % carbon 28.8 - 30.9 % carbon 44%-45% carbon 58.6%-74.6% carbon 64.4 - 71.2% carbon 64.7 - 70.2% carbon:43.0 - 46.1 % cis and trans,98% cis and trans,99% co 7.8 - 8.2%,溶剂:40%-80%的石脑油 co ≥31% conductivity 10-50 s/cm (pressed pellet) contains >100ppm mehq as inhibitor, 97% contains 150ppm bht as inhibitor, 98% contains 700ppm monomethyl ether hydroquinone as inhibitor contains 75-125 ppm monomethyl ether hydroquinone as inhibitor, >90% contains ≤2% bht as stabilizer, 98% content(1-mcp): ≥4.0%,carrier cyclodextrin cp ,99% cp(中国药典) cp,>98%(gc) cp,>98.0%(gc) cp,60.0% cp,80% cp,85.0% cp,88% cp,90% cp,90.0% cp,96.0% cp,99%,1-4mm cp,99%,粉末 cp,co 43.0 - 47.0 % cp,mn >44% cp,≥97.0%(rt) cp,含200-650ppm mehq稳定剂 cp,粉末 cr 24% crude source of omega-3 fatty acids crystalline cu>36% cu:8% cu:9.5%-10.9%,200目 cu≥8% d,98% + bht d,99%,无水级 d,99.5%+ dcl 35% w/w solution in d2o d,99.5%+0.05% v/v tms d,99.5%,90% in d2o d,99.5%,98% in d2o d,99.50% d,99.6% d,99.8% (0.05% v/v tms) d,≥98% d-glu:d-lys (6:4), mol wt 20,000-50,000 d.98% d.99.9% +0.03%tms d.99.9% d13, 98% d40 d50~300nm d60 d80 diam. 3 mm, ≥99.95% metals basis diameter 2.0 - 2.9μm,2.5% w/v,正电位 doped, conductivity 0.5-1.5 s/cm (pressed pellet, typical), extent of labeling: ~5 wt. % loading, coated on titanium dioxide doped, conductivity 30 s/cm (bulk), extent of labeling: 20 wt. % loading, composite with carbon black dye content 75 % dye content 80% dye content 85% dye content 90 % dye content 95% dye content 97% dye content ≥95 % e-1006,羟值:132±5 e-1306,羟值:120±5 e-1310,羟值:88±5 e-1340,羟值:28±5 electronic grade, 99.999% trace metals basis electronic grade ep,bp,jp,usp级 epoxy value:0.28-0.35 eq/100g epoxy value:0.43 epoxy value:0.54-0.59/100g epoxy value:0.5 epoxy value:0.65~0.70 epoxy value~4 ep级,平均粒径:0.1-0.3μm ester terminated, 0.55-0.75 dl/g ester terminated, lactide: caprolactone 70:30 ester terminated, lactide:glycolide 82:18, viscosity:1.7-2.6 dl/g ester terminated, lactide:glycolide 85:15, viscosity:2.5-3.5 dl/g ester terminated, lactide:glycolide 85:15, viscosity:5.0-7.0 dl/g ester terminated,lactide:glycolide 50:50,mw 24000-38000 ester terminated,lactide:glycolide 50:50,mw 38000-54000 ester terminated,lactide:glycolide 50:50,mw 7000-17000 ester terminated,lactide:glycolide 75:25,mw 76000-115000 ester terminated,lactide:glycolide 85:15,mw 190000-240000 ester terminated,mw 50000-75000 ester terminated,mw 54000-69000 esterterminated,l-lactide:d,l-lactide70:30 extent of labeling: 12-15mol per mol β-cd fcc fe ~20% fe>26%, powder fe>30.5% fe, 24% fe,60.0 - 72.0 % fe2o3≤10ppm fe2o3≥85% fg fmp(显微镜用) for analysis emsure for electrochemistry, ≥98.5% (qnmr) for enzymic, spectrophotometric determination of h2o2, ≥98% for enzymic, spectrophotometric determination for fluorescence,≥98.0% for gc, ≥95% for gc-hs,≥99.9%(gc) for hplc, 50% in water, 49-51% (t) for hplc, ≥99.0% for hplc,>99.8% (gc) for hplc,≥95% for hplc,≥99.0%(t) for hplc,≥99.5% for hplc,≥99.9% for hplc for ion-pair chromatography,98% for ir-spectroscopy for lc-ms for nmr spectroscopy,≥99.9%(gc) for plant cell culture,98%(hplc) for plant cell culture,≥99% for spectrophotometric det. (of b, pb) for spectrophotometric det. of ag, fe, ru, ≥98.5% for spectrophotometric det. of amino sugars, ≥99% for spectrophotometric det. of au, no2-, ce(iv), for the detection of au, co, cu, scn-, v, ≥97% for spectrophotometric det. of au,tl(iii),w, ≥99% for spectrophotometric det. of co(ii), cu(ii), ≥90% for spectrophotometric det. of cu, zn for spectrophotometric det. of fe in serum, ≥99% for spectrophotometric det. of fe(iii), ≥98.5% for spectrophotometric det. of fe, ≥97% for spectrophotometric det. of isonicotic hydrazide, amines and amino acids, ≥98%(t) for spectrophotometric det. of metal ions, ≥99% for spectrophotometric det. of mo, sn, w, and also ag and re, ≥97% for spectrophotometric det. of nitrate and nitrite, ≥99% for spectrophotometric det. of nitrate and perchlorate, ≥97% for spectrophotometric det. of proline and thiophene, ≥99% for spectrophotometric det. of s2-,cl2, ≥99% for spectrophotometric det. of si, ≥95% for spectrophotometric det. of so42-, s2-, ≥97% for spectrophotometric det. of transition metals, ≥95% for spectrophotometric det. of zn(ii), cu(ii), fe(ii), co(ii), h2o2, ≥95% for spectrophotometric det., bi,71-74% bi basis (kt) for spectrophotometric det., ≥99% for spectrophotometric determination of metal ions for spectrophotometric for the spectrophotometric det. of bi, co, ≥97% for the spectrophotometric det. of fe, ≥98%(hplc) for the spectrophotometric determination of fe, pd, v, ≥99% for tlc derivatization, for spectrophotometric det. of phosphorus-containing pesticides, ≥98% for use in transformations, x-ray crystallography and nmr formicroscopy free macrogoly, 25-40% glu:tyr (4:1), mol wt 20,000-50,000 gr 85%+ gr, 99.5% gr,40.0% gr,70% gr,≥60% gr,≥85 wt. % in h2o gr,≥90% gr,≥99% gr,≥99.0%(gc),用于测定醛 gr,≥99.0%(t) gr,≥99.5%(gc) gr,≥99.5%(rt) gr,≥99.8% grade 135 granular hlb值:13-14,ph值:5.0-7.0 hlb值:16~17 hlb值:9-10,ph值:5.0-7.0 hp-55s,邻苯二甲酰含量24% hplc hpo3≥38% indicator ind inherent viscosity: 0.3-2.5dl/g ir 35% in hcl ir 48.0 - 55.0 % ir 50-54% ir:73% isomeric mixture lactide:glycolide(50:50),mol wt 30000-60000 lactide:glycolide(65:35),mw 40000-75000 lactide:glycolide(75:25),mol wt 66000-107000 leucine aminopeptidase inhibitor liquid m.w 1000 m.w 2000 m.w 3000 m.w :30000-100000 m.w. 28000 m.w. 4000 m.w. 5000 m.w.10000 m.w.1000 m.w.1500 m.w.175,000, 米黄色固体 m.w.20000 m.w.5000 may contain up to 10% ethanol,85% may contain ≤10% dmf mgo:45% mix tbc as stabilizer mix.80% mixed,50% in propylene carbonat mixture of isomers,90% mixture of oligomers,98% mn 2,000 mn 4000,50%溶液 mn ca. 6% mn ~300,000 mn ~492 (n≈6) mn ≥71.0%,bet surface area 5~7 m2/g mn: 2500-3000, viscosity: 32-42cps, contains <100 ppm mehq as inhibitor mn~25000 mn~3000 mn≥4.0%水溶液 mo 56.5% mol wt >30,000 mol wt 15,000-20,000 da mol wt 150,000-350,000 mol wt 5000 mw 1000, 含0.5-1 wt% bht稳定剂 mw 2000 mw 3000 mw ~315 mw ~480 mw ~590 mw ~60,000 mw520,000,mn150,000(typical),acrylamide~80wt.% mw:1000 mw:2000 mw:273,油溶性 mw:317,油溶性 mw:4000 mw:405,溶于水和有机溶剂 mw:5000 mw:625,水溶性 mw:845,水溶性 mw<5000 mw=1000 mw=2000 mw=5000 mw~1000 n 8% n=2 nanoparticles, dispersion, in h2o nanopowder, <100 nm particle size (laser psa), 99.8% trace metals basis nanopowder, <100nm particle size (bet), >97% trace metals basis nanopowder, <200nm particle size (bet), >99% ni 61% ni:47% ni≥180g/l n~10,average mn ~711 n~100,average mn ~4670 n~20 n≈100 n≈40 os 38.7% os 42.5% os 83% particle size:3 mm,mw ~110,000 particle size:3 mm,mw ~80,000 pb ≥82% pb:59.35~61.36% pc50 pc60 pc70 pc80 pc90 pd 13.0-15.0% pd 14.2% pd 14.5% pd 15.2% pd 17.1% pd 18% pd 18.09 wt. % in nitric acid pd 20.8% pd 21.5% pd 23.9% pd 26.2% pd 27.7% pd 34.9% pd 37.3% pd 4-5% w/w (cont. pd) pd 40 % pd 41.0% pd 44.8% pd 51.2%-53.9% pd 58.2% pd 59-60% pd ~40.0% pd ≥20.5% pd ≥27.5% pd ≥32.6% pd ≥36.5% pd ≥39.0% pd ≥44% pd ≥50% pd ≥85% pd,27.4% peg average mn 2,000 peg400ml peg400mo peg600mo peh-15 peh-3 peh-6 pellets ph eur ph. eur.,bp,usp,99-100.5% powder,1-2 μm,99% powder,acs,≥98.0% ppg-1000do ppg-2000do practical grade, ≥85% (titration), powder predominantly trans 95% protease substrate pt 10% pt 15% pt 15.2% pt 20% pt 34.0% pt 43.7% pt 5% pt 50.5% pt 51.6-52.6% pt 59.0% pt 59.7% pt 65% pt basis ≥73% pt ≥24.2% pt ≥57% pt ≥64.5% pt, ~2% 二甲苯溶液 pt,18.02% pt,99.9-100.1% pt:≥58% pt≥43.4% purified by redistillation,≥99.5% puriss., >= 99.0 % gc purum, ≥98.0% (tlc) ratiocarbondioxide/dimethylamine<2:1 reagent grade,98.0% reagent grade red(hematite)(99.8%-fe) research grade, 99 atom % 13c rh 11.2% rh 17.1% rh 18.5 - 21.3% rh 21% rh 21.3% rh 25.3% rh 27.5% rh 30% min rh 38.5-42.5% rh ≥23.3% rh ≥8.7% rh:43.0%-46.6% roplatinum(iv), pt 52.6% ru 1.5% w/v ru 23.0% min ru 29% min ru 35.8-36.1% ru 40-45% ru 5% ru content 45-55% s: 13.5-15.5% sio2,44-47% sn 56.5%±0.5% sn>18.8% sn≥42% sn≥46% solid content 99% solid, >= 98 % hplc solid, ≥98%(hplc) solution 0.25 m in thf solution complete solution incomplete spectrophotometric grade, 99% spectrophotometric grade stab. with 0.5% 4-methoxyphenol stabilized with bht 1 % w/w standard for gc, >99.5% standard for gc, 99% standard for gc, 99.9% standard for gc, ≥99.5% standard for gc,≥99.5% strength ≥290% sublimed,>99% suitable for fluorescence, ≥75% (hplc) suitable for plant cell culture, bioreagent, liquid sum isomers (gc): ≥ 98.0 % (a/a) surface area 800-1075, pore volume 0.31-0.41 su synthetic, 98% t-98% tech grade, 95% tech. 80% tech. 90%(异构体的混合物) tech.85% tech.90% technical grade, 80 % technical grade, 80% technical grade, 85 % technical grade, 85% technical grade, 90% technical grade,90% technical, 0.5-1.5 m in diethylene glycol diethyl ether technical, ≥84% technical, ≥85% (gc) ,含铜屑稳定剂 technical, ≥90 % technical, ≥90% (gc,mixture of isomers) technical, ≥90% (t) technical,75% technical,90%,ee 99+% technical,≥85 % technical,≥85% technical,≥90 % sum of enantiomers technical,≥90%(gc) the jnk3 inhibitor xii, sr-3576, also referenced under cas 1164153-22-3, controls the biological activity of jnk3. this small m ticl3:76.0-78.5% tungsten(w):41.5 - 69.2 % ulc-ms,0.04% in water ulc-ms,0.3% in water ultra pure,≥99.0% umicore undoped, extent of labeling: ~20 wt. % loading, composite with carbon black usp,ep usp,ph eur usp级,cross-linked,粉末 v/v vetranal, analytical standard viscosity 1,300-2,200 cp (25 °c)(lit.) viscosity 1.4dl/g viscosity 150-300cst(25 °c) viscosity 400-600cst(25 °c) viscosity 5-8cst(25 °c) viscosity 600-1000cst(25 °c) viscosity 70-75cst(25 °c) viscosity 80-150cst(25 °c) viscosity 800-1200 cst(25 °c) viscosity 800-1400cst(25 °c) viscosity,1.5-2.2dl/g viscosity:800-5000 mpa.s white granular,viscosity:0.8-0.83mpa·s wo3≥85% zero2, ≥98.0% zn 10-12%,325目 zn 10-12% zn: 19%-22% zno≥61%, cro3≥19% zn≥ 35.5% zro2≥20% ~0.1 m in h2o ~0.5 m in tert-butyl methyl ether, ≥97.0% (hplc) ~0.5m in 2-methyltetrahydrofuran, ≥95.0% ~0.8m in hexane ~10% (~1.3 m), for gc derivatization,mkseal ~10% in h2o ~100μg/ml in ethanol, ≥97% ~17% aromatics basis ~20% in h2o ~200 mesh, 99% ~20wt. % in d2o, 98 atom % d ~25% in h2o ~25% in methanol ~30% in h2o ~40% in h2o ~5% in h2o ~65%水溶液 ~70% alpha-thujone basis, ~10% beta-thujone basis ~75%(al) ~80% in h2o, for spectrophotometric det. of palladium, iron, uranium(vi), molybdates and nitrites ~85% (kt) ~90% (t) ~95% (tlc) α相,99.9% metals basis β-phase,95%,1-3μm β相,99.9% metals basis φ5mm 高2.5mm 圆柱体,ge≥99.999% ≤10% water ≤3% water ≥ 98 % hplc ≥ 98% ≥ 99.0 % ≥0.15 units/mg dry weight ≥0.2 units/mg ≥100,000-500,000 units/ml ≥18% na (as na2o) basis, ≥60% si (as sio2) basis, powder ≥2 units/mg dry weight ≥20 units/mg dry weight ≥200 iu/mg ≥200 units/mg dry weight ≥28% nh3 in h2o,电子级 ≥29% ti (as tio2) basis, technical ≥30% ≥300 units/g dry weight ≥300,000 units/mg protein ≥35% ≥37% ru basis ≥4 units/mg protein ≥40% zro2 basis ≥40%(gc) ≥40%,含菜油甾醇乙酸酯 ≥40% ≥40.0% ≥400 u/mg ≥45%(e) ≥5 units/μl ≥50 units/mg dry weight ≥50% ≥50.0% pt basis ≥52% ≥55%(hplc) ≥57% ≥6,000 units/mg protein ≥60% (hplc) ≥65%(gc) ≥65%(hplc) ≥65%,含3-磺酸邻苯二甲酸盐 ≥65%,含有异构体 ≥65% ≥65.0%(gc),含2000ppm生育酚稳定剂 ≥70% (gc) ≥70%(t) ≥70%,α-和β-位的混和物 ≥70%,含苯酚 ≥70%,块状 ≥72% (elsd) ≥75%,单钠盐和二钠盐的混合物 ≥75%,含5-甲基-4-己烯-2-酮 ≥75%,顺反异构体混合物 ≥78%(t) ≥80% (ce) ≥80% (gc); 80% ≥80% (hplc) ≥80%(hplc) ≥80%,最多含10%的乙醇 ≥80.0% ≥84% ≥85% (gc) ≥85% (hplc) ≥85% (page),不含钙 ≥85%(gc)(n) ≥85%(hplc)(t) ≥85%,nmr ≥85%,含水约30% ≥85%,外消旋和内消旋混和物 ≥85%,用于荧光分析 ≥88% (uv-vis) ≥88%,顺反异构体混和物 ≥88% ≥90% (gc), mixture of isomers ≥90% (hpce) ≥90% (hplc),用于荧光分析 ≥90% (t) ≥90% (vpcc) ≥90%(lc-ms) ≥90%,gc ≥90%,n=9 ≥90%,异构体混合物 ≥90%,苏-和赤-的混和物 ≥90%,顺反异构体混合物 ≥90.0 % ≥90.0% (hplc) ≥90.0%,顺反异构体混和物 ≥900ug/mg,dry basis,de-nacl and residual solvents ≥91%,浊点90℃ ≥92%(lc) ≥92%, 500 ppm bht as stabilizer ≥92%,80-150目,中性 ≥92%,80-150目,碱性 ≥92%,80-150目,酸性 ≥92.5% ≥93% (gc) ≥93% (hplc) ≥93%(hplc),用于荧光分析 ≥93%(hplc) ≥93%,含稳定剂tbc ≥93%,异构体的混和物 ≥93.0% (gc) ≥93.0% (qnmr) ≥93.0%(gc) ≥94% (oligomer purity) ≥94%,顺反异构体混合物 ≥94.0 %(gc) ≥94.0% (hplc) ≥94.0% (tlc); 94% ≥94.0% ≥95% (lc/ms-elsd) ≥95% (nmr) ≥95% (oligomer purity) ≥95% (tlc), ~1mg/ml in methanol: nh4oh (7:3) ≥95% (uv) ≥95% h4p2o7 basis ≥95%(gc&t) ≥95%(hg) ≥95%(hplc), 50mg/ml in water ≥95%(lc-ms) ≥95%(t),非对映异构体混合物 ≥95%(tbc作为稳定剂) ≥95%, ee99% ≥95%, stabilized, fg ≥95%, ~1m in h2o ≥95%,2000目 ≥95%,[(5e,9e,13e)-和(5z,9e,13e)异构体混合物] ≥95%,mixture of isomers ≥95%,≥250g/l in water ≥95%,≥99% e.e. ≥95%,异构体的混和物 ≥95%,支链异构体类的混和物 ≥95%,混合物 ≥95%,立体异构体混合物 ≥95%; 100%ee ≥95.0 % ≥95.0% (h-nmr) ≥95.0% (nt) ≥95.0% (qnmr) ≥95.0%(gc),mixture of isomers ≥95.0%(gc),含稳定剂氢氧化钾 ≥95.0%,mixture of isomers ≥96%(gc&t) ≥96%(hplc)(t) ≥96%(lc&n) ≥96%, fcc, fg ≥96%, n≤0.0005% ≥96%,sum of enantiomers ≥96%,含稳定剂hq ≥96%,立体异构体混合物 ≥96%,顺反混合物 ≥96.0% (gc); ≥96.0% ≥96.0% (gc) ≥96.0% (hplc) ≥96.0% (nt) ≥96.0% (reversed phase hplc) ≥96.0%(gc) ≥96.5% (hplc); 96.5-103.5% (at); 97% ≥96.5% (hplc); 97% ≥97 atom % d, ≥99% (cp), contains hydroquinone as stabilizer ≥97% (chn) ≥97% (enzymatic) ≥97% (hpce) ≥97% (hplc), white powder ≥97% (nmr) ≥97% (t) ≥97% (tlc) ≥97% ,≥99% ee ≥97%(gc&n) ≥97%(gc), 异构体混合物 ≥97%(hplc)(n) ≥97%(t)(hplc) ≥97%(ti) ≥97%(w) ≥97%(铜片作为稳定剂) ≥97%, 2 mg/ml in methanol ≥97%, fg ≥97%,mixture of isomers ≥97%,含有稳定剂吩噻嗪 ≥97%,含稳定剂tbc ≥97%,混和物 ≥97%,约含≤2%2-丁醇 ≥97%,非对映异构体混合物 ≥97%,顺反混合物 ≥97.0 % ≥97.0% (calc. based on dry substance, nt) ≥97.0% (hplc),用于荧光分析 ≥97.0%(hplc) ≥97.5% (gc); 98% ≥97.5% (hplc) ≥97.5%; 97.5-102.5% (titration); 98% ≥98 % hplc, solid ≥98 atom% d ≥98% (enzymatic) ≥98% (gc), ~10 mg/ml in methanol ≥98% (gc) ≥98% (hplc), oil ≥98% (mixture of regioisomers) ≥98% (tlc); ≥98% (as erucic acid) ≥98% hplc, solid ≥98% sum of enantiomers ≥98%(0.1%生育酚作为稳定剂) ≥98%(gc)(n) ≥98%(gc)(t ≥98%(gc),含稳定剂mehq ≥98%(gc),含稳定剂tbc ≥98%(hplc)(t ≥98%(hplc), oil ≥98%(lc&w) ≥98%(n&t) ≥98%(s,s)-me-bpe-rh ≥98%(sum of enantiomers) ≥98%(t&n) ≥98%(tlc) ≥98%(w) ≥98%(铜片作为稳定剂) ≥98%, 1mg/ml in dcm solution ≥98%, 25 mg/ml in ethanol ≥98%, 50mg/ml in ethanol ≥98%, hplc ≥98%, ni:22.5%+ ≥98%, 含稳定剂mehq ≥98%, 顺反混合异构 ≥98%,1h-,2h-异构体混合物 ≥98%,hplc ≥98%,kosher ≥98%,particle ≥98%,pellets(anhydrous) ≥98%,ru>15.75% ≥98%,≥99%e.e. ≥98%,二结晶水 ≥98%,含pth-别异亮氨酸 ≥98%,含稳定剂koh ≥98%,含稳定剂丁基硫醇 ≥98%,含稳定剂吩噻嗪 ≥98%,外消旋和内消旋混合物 ≥98%,生物技术级 ≥98%,白色 ≥98%,细胞培养级 ≥98.0% (at) ≥98.0% (f) ≥98.0% (gc); ≥98.0% ≥98.0% (hplc),用于荧光分析 ≥98.0% (sum of enantiomers, gc) ≥98.0% (sum of isomers, hplc), ~2500 u/mg, stabilized with bht ≥98.0%(gc),inhibited with 100 ppm mehq ≥98.0%(gc),mixture of isomers ≥98.0%,hplc ≥98.5% (nmr); 99% ≥98.5% (sum of enantiomers, gc); 99% ≥99 % hplc, powder ≥99 atom % d, ≥99% (cp) ≥99 atom %13c, ≥99% (cp) ≥99% (cp) ≥99% (sum of isomers) ≥99%(75% in ethyl acetate solution) ≥99%(hplc)(t) ≥99%(n) ≥99%, 4-16mesh ≥99%, 5% w/v异丙醇溶液 ≥99%, in 100mg/ml ethanol ≥99%, ni:≥47% ≥99%, suitable for determination of sulfhydryl groups ≥99%,300目 ≥99%,含50 - 100 ppm bht 稳定剂 ≥99%,异构体混合物 ≥99%,无氯 ≥99%,混合物 ≥99%,粒度:>10um,白色粉末 ≥99%,粒度:>10um,黄色粉末 ≥99.0% (c) ≥99.0% (tlc) ≥99.5 % ≥99.5 atom % d, ≥99% (cp) ≥99.5% (hplc) ≥99.5% (metals basis) ≥99.5%(lc) ≥99.5%(电子级) ≥99.5%,100nm ≥99.5%,gc ≥99.5(gc),含0.01% koh稳定剂 ≥99.7%(gc) ≥99.9% (gc) ≥99.95% metals basis ≥99.98% metals basis ≥99.99 % ≥99.99% metals basis,200目 ≥99.99% metals basis,99.7-100.5% dry basis ≥99.999% metals basis,粒径:1-6mm 丰度:10atom %;化学纯度:≥98.5% 丰度:10atom%;化学纯度:≥98% 丰度:98atom%;化学纯度:≥99% 丰度:99atom%;化学纯度:≥99% 乙烯含量: 50% 二氧化硅:38.0%~42.0% 二聚,三聚和四聚甘油 ≥75 w/%,七聚甘油以上 ≤10w/% 亚胺当量(克当量): 130 ~ 150 从紫胶所得 优级纯 光玻级,99.99% metals basis 光致抗蚀剂级,99% 光谱级,≥99.8% 光谱纯,>99%(gc) 分子量 7000~8000 分子量 8000-10000 分子量2000 分子量240kda,脱乙酰度大于90%,取代度90% 分子量3000 分子量:10-20万 分子量:1200 分子量:150-250万 分子量:20-40万 分子量:3500-4500 分子量:40-80万 分子量:4000-5000 分子量:80-150万 分子量:900 分子量~1200 分析对照品, >98% 分析对照品, 100ug/ml in methanol 分析对照品, 98% 分析对照品, hplc≥98% 分析对照品, ≥99%(hplc) 分析对照品, ≥99% 分析对照品, ≥99.6%(hplc) 分析对照品,95% 分析对照品,97% 分析对照品,99.95% 分析对照品,>97% 分析对照品,hplc≥95% 分析对照品,≥97% 分析对照品,≥97.5% (gc),≥95 atom % d 分析对照品,≥98%(hplc) 分析对照品,≥98.5% 分析对照品,≥99.7%(gc) 分析对照品,≥99.7% 分析对照品,混合物 分析对照品hplc≥98% 分析标准品,1000μg/ml甲醇溶液 分析标准品,98.6% 分析标准品,99.93% 分析标准品,99.95% 分析标准品,≥99% 分析标准品,异构体混合物 分析滴定液,0.1m 制备色谱级,99.8% 加约40%水湿润,本品干重约为25g 助滤剂 包含 100 ppm naoh 稳定剂, 99% 包含1500 ppm 对苯二酚稳定剂, 90% 包含50-185 ppm mehq稳定剂, 98% 包含≤1000 ppm 氧化丙烯稳定剂, 98% 包含有200 ppm mehq阻聚剂, 99% 医用级,白色 医用级,红色 升华, 99.9% (reo) 升华品99% 升华树枝状, 99.9% (reo) 单酯和二酯的混合物 合成洗涤剂助洗剂用 含0.2 % 碳酸钾稳定剂, 97% 含≤650 ppm mehq 稳定剂 含固量:40±2% 含有3-磺基邻苯二甲酸,约50%的水溶液 含百秋里醇(约26%~33%) 含紫苏醛≥55% 含量(p2o5)% ≥85% 含量测定 含铂量:27% 固含量:99% 固含量~70% 块状,99.9% metals basis 型号:6501(1:1) 基质:sio2,表面基团:-epoxy,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位10mg/ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/1ml 天然矿物,晶粒,大约 0.06-19in 季铵盐含量:≥45% 室温,惰性气体氛围 容量法,0.1000mol/l(0.1n) 工业级, contains 1% hydroquinone as inhibitor 平均分子量 ~400 平均分子量1800 平均分子量2500 平均分子量3300 平均分子量8000 异构体混合物, 40 wt. % in h2o 异构体混合物,80% 异构体混合物,97% 异构体混合物,99% 异构体混合物,含稳定剂mehq 异构体混合物 异构体的混和物 总胺值(mg koh/g): 115±4 总胺值(mg koh/g): 157±5 总胺值(mg koh/g): 40±2 总胺值(mg koh/g): 49±2 总胺值(mg koh/g): 60±3 总胺值(mg koh/g): 79±3 总胺值(mg koh/g):173~183 总胺值:178-188mgkoh/g, 酸值<10mgkoh/g 总胺值mgkoh/g 18~22,叔胺值mgkoh/g 18~22 总胺值mgkoh/g 28~32,叔胺值mgkoh/g 28~32 总胺值mgkoh/g 44~50,叔胺值mgkoh/g 44~50 总胺值mgkoh/g 50~60,叔胺值mgkoh/g 50-60 总胺值mgkoh/g 75~85,叔胺值mgkoh/g 75~85 总酰胺:375-450 mg/g 手性纯99% 摩擦片专用,97%,1250目 支链异构体混合物,含稳定剂mehq 方铅矿(galena),天然,0.06-0.19inch 无定型, 2-6mm (0.08-0.2in),99.999% (metals basis) 无定形, 0.5-2μm, 99.9% 无定形,<5μm,98% 无定形,99%,粒径(d50) 10-20um 无水 99.9%(reo) 无水, 99.95% 无水, 99.995% 无水, 粉末, 99.5% metals basis 无水, 粉末, 99.9% 无水, 粉末, 99.999% metals basis 无水, 粉末, ≥99.99% metals basis 无水,99.5% metals basis 无水,99.999% metals basis 无水,99.999% 无水,≥98% 无水,片状,99.9% metals basis 无水,粉末,99.99% metals basis 无水,鳞片, 99.99% metals basis 无水级, 99.99% metals basis 无水级,≥99.9%,含50ppm bht 抑制剂 昆虫细胞培养级, ≥99% 晶体, aps ≈100nm, 99%, 等离子合成 晶状, -4+40 目,99.9999% (metals basis) 有效氯 13%~16% 有效氯 ≥60% 有效氯:7.5%,游离碱含量:0.1-1% 松油烯-4-醇含量:≥35% 柠檬烯>90% 树脂专用 植物细胞培养级,≥99.5% 橙色结晶 比表面积10-15m2/g,粒度20nm-100nm,99.9% 比表面积3-8m2/g,粒度80nm,99.9% 氮≥19.5 % 氮含量:18.1-18.7% 沸点130-134℃ 沸点184-188℃ 油状50% 涂料专用型,98.5%,6000目 淡黄水珠 淡黄液体 游离的液体98% 灰白色粉末 灰色粉末 特级 环保试剂,96% 环氧值:0.35~0.40eq/100g,粘度(25℃):40~80mpa.s 环氧值:0.70~0.80mol/100g,粘度(25℃):5~25mpa.s 环氧值eq/100g:0.70 环氧当量117-120gm/eq 环氧当量:143-154克/当量,粘度:100-300mpa·s 玻璃钢专用 生物医用级,≥98.0%,<70μm 生物基含量33%-100% 生物技术级,≥99% 生物技术级,≥99.9% 生物试剂级,99.0%,荧光分析专用 用于gc衍生化, ≥98.0% 用于分子生物学,≥99.0%(t) 用于分子生物学,≥99.5% 用于尿素的分光光度测定,99% 用于检测类固醇,≥99.0%(hplc) 用于氨基酸分析,≥99.5%(gc) 用于电池,粒度:7-10um,99.9% metals basis 用于组氨酸甲基化 用于细胞和昆虫细胞培养, 81-83% as moo3 用于荧光分析,99.7% 用于药物研究 用于蛋白质分离,层析 电子级,0.3~0.5um,99.5% 电子级,99.98% metals basis 电子级 电子陶瓷专用 电泳专用级 电泳级,≥99% 电镀级,99% 白色,al2o3≥30% 白色到淡黄色粉末 白色固体 皂化值:84-94mgkoh/g, hlb值:13-14 皂化值mgkoh/g:235~245 盐水溶液 直径:1.0mm, 退火, 99.9995% metals basis 石化用芳烃油脱烯烃吸附剂 石油催化剂专用 硬脂酸和棕榈酸:≥ 90.0% 碲粒 2-3mm 99.999% 碳含量:43-48% 磷含量: 23%-24% 离子对色谱专用,≥99.0% 筹码专用,98%,3000目 粉末, 98% 粉末, 99.99% metals basis 粉末,99.5% 粉末,99.99% metals basis,100目 粉末,99.99% metals basis,200目 粉末,99.99% metals basis 粉末 粉末磷脂 粉煤灰活化剂用 粒度 6~10μm,防腐级 粒度:2-20μm 粒径:50nm 粒状,1-4mm,99.999% metals basis 粘度(5%水溶液,20℃):500-20000mpa.s 粘度900-1300cps 粘度:20~25mpa.s 粘度:3000~6000 cps;115~135 gm/eq 粘度:600-1200mpa.s(25℃),环氧当量:150-180 g/mol 粘度:~300 cps,环氧当量:95-115 gm/eq 粘度:~600 cps,环氧当量:95-115 gm/eq 紫外线测试 红外分析用,≥99% 红外测油仪专用, 99% 红棕色粉末 红色固体 约0.5mol/l的水溶液 约10%于四氢呋喃中 约12.5%于四氢呋喃中, 约1.5mol/l 约13%于四氢呋喃中, 约2mol/l 约15%于四氢呋喃中, 约2.0mol/l 约15%于己烷中 约16%于四氢呋喃中, 约1mol/l 约20%于二氯甲烷中,约1mol/l 约20%于水中 约4%于n,n-二甲基甲酰胺中,约1mol/l,mkseal 约40%水润湿品 约40%水溶液 约44%于异丙醇,水中 约63%于异丙醇中 约70%的水溶液 约75%于水中 约85%的水溶液 细胞培养级,98-101% 结晶, aps ≤50nm, 98%, 气相激光合成 缓冲溶液, 10-40 units/mg protein (biuret) 羟值(mg koh/g):133~148 羟值(mg koh/g):23.0-25.0 羟值mgkoh/g:28±3 羟值mgkoh/g:40±4 羟值mgkoh/g:52±6 羟值mgkoh/g:67±5 羟值mgkoh/g:≤15,皂化值mgkoh/g:180~190 羟基值5462 mg koh/g 耐火材料粘结剂用 脱乙酰度 80.0%-90.0% 脱色率≥90 %, 活性度≥180 h+mmol/kg, 水分≤10 % 脱色率≥90%, 比表面积≥180 m2/g, 水分≤3.0 %, 颗粒平均抗压力≥1 n, 抗水型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0 %, 颗粒平均抗压力≥1 n, 脱氮型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0%, 颗粒平均抗压力≥0.7 n 脱色率≥90%, 比表面积≥300 m2/g, 水分≤8.0%, 颗粒平均抗压力≥1 n 脱色率≥92 %, 活性度≥100 h+mmol/kg, 水分≤12 % 脱色率≥95 %, 活性度≥160 h+mmol/kg, 水分≤12 % 脱色率≥98% 色谱级, ≥99.9% 苯酚含量:40-60% 荧光粉专用 荧光级,>97%(hplc) 荧光级 药用注射级 药用级,99.5% 药用级,ph eur 药用级,≥99.5%(gc) 药用级 药用试剂级 蒸馏枝形片状 99.95% metals basis 蒸馏树枝状, 99.9% (reo) 蒸馏纯化,≥99.5% 试剂级,70%溶液 试剂级,ir>52% 质量浓度 1000mg/l,u=16 mg/l 超干, 99.9% metals basis 超干, 99.998% metals basis 超干,99.995% metals basis 超干,99.999% metals basis 超纯级,>99.5%(gc) 超纯级,99% 超纯级,99.9% 软型,直链异构体的混和物 轻质,99% 通常38% 溶剂油溶液(6%fe) 通常92%, 溶于2-二乙基己酸 造影级 酐:90%酸:10% 酸值(mg koh/g) ≤0.5, 皂化值(mg koh/g): 325~360 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 100~130 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 85~105 酸值mgkoh/g ≤10,皂化值mgkoh/g 120~140 酸值mgkoh/g ≤10,皂化值mgkoh/g 212~222 酸值mgkoh/g ≤3,皂化值mgkoh/g 210~220 重蒸馏, ≥99.5% 金黄色,al2o3≥30% 钌含量75% 钙基, 比表面积 240 m2/g 钛酸铅 粉末, 钛酸镁 粉末, 钠基, 比表面积 240 m2/g 钯含量 0.5% 钻井液和完井液助剂用 铁含量≥37 铂含量,>99.9%,粒径10 nm 铂含量:52.0% 铂含量≥85.4% 铑含量(wt%) ,5% 铑含量,10.1% 铱含量:43.0% 铱含量≥39% 锑含量≥60% 锭, 99.9% metals basis 锭,99.5% 镀膜级,99.99% metals basis,3.5-5 mm 镀膜级,颗粒,99.9% metals basis 镁含量:57% 镍 45.0 - 52.5 % 闪烁纯,99% 阴离子型,1800万分子量,水解度:20-30% 阴离子型,1800万分子量,水解度:5-17% 阴离子型,2500-3000万分子量,水解度:5-17% 非离子剂, 酸值<5.5mgkoh/g 非离子剂 非离子型,分子量:1600万 非离子型,分子量:1800万 非离子型,分子量:2000万 顺反异构体混和物 饱和溶液 高纯级,>99.5%(gc) 高纯级 黄腐酸fa ≥90% 黄色粉末

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